Serving  Our Guest Log in    Register View prices in  or ...    
ALL CATEGORIES   Semiconductor Mfg   View   Search-by-Specs   
View All Listings Under

Wafer Fabrication Equipment


» Switch Major Category
Click an item's ID# below for its full specifications and source, or:

Group Listings into sub-categories under Wafer Fabrication EquipmentGroup Listings into sub-categories under Wafer Fabrication Equipment

List all 98 product types under Wafer Fabrication EquipmentList all 98 product types under Wafer Fabrication Equipment


  • To sort on a column, click the column head; click it again to reverse the sort.
  • Click the links under the Product Type column head to see other like items of that type.
Displaying 1-100 of 164  Page  No Previous Page  Show Next Page
 Offered (box) or Wanted (coins)  Item ID  Photo Short Description Product Type / Details # Price Notes Location
Make Model
  $  
187746
Applied Materials  

Applied Materials  

AMAT Enabler chamber 

List all items of this typeCluster Plasma Tools - Oxide

in Cluster Plasma Tools

2   F* Dresden, Saxony
2x AMAT Enabler chamber:

ETC380-02-B und ETC380-05-D
AMAT Enabler chamber manufactured 12/2002 und 03/2007

195982
Accent Optical  

Accent Optical  

Caliper Elan 

List all items of this typeLithography Equipment - Other

in Lithography Equipment

1   Dresden, Saxony
Accent Optical, CALIPER ELAN, 300mm, Overlay Measurement:
Accent Optical, CALIPER ELAN, 300mm, Overlay Measurement




!!!MULTIPLE UNITS AVAILABLE.  PLEASE INQUIRE!!!
187744
Applied Materials  

Applied Materials  

AMAT Axiom strip chamber  

List all items of this typeCluster Plasma Tools - Oxide

in Cluster Plasma Tools

1   Dresden, Saxony
AMAT Axiom strip chamber :
AMAT Axiom strip chamber
187742
Applied Materials  

Applied Materials  

AMAT Centura Rev.4 for 12 " 

List all items of this typeCluster Plasma Tools - Silicon

in Cluster Plasma Tools

1   F* Regensburg, BY
AMAT Centura Rev.4:
AMAT Centura Rev.4
Serial Number: 40 99 39 


AMAT Centura Rev.4 
Serial Number: 40 99 39 
Equipment Code: ETC320-05
AMAT Centura Rev.4;
300mm AMAT Centura Rev.4;
with 2 Load Locks and 2 Load Ports
187743
Applied Materials  

Applied Materials  

AMAT eMax CT chamber  

List all items of this typeCluster Plasma Tools - Oxide

in Cluster Plasma Tools

1   Dresden, Saxony
AMAT eMax CT chamber :
AMAT eMax CT chamber
187747
Applied Materials  

Applied Materials  

AMAT eMax CT plus chamber 

List all items of this typeCluster Plasma Tools - Oxide

in Cluster Plasma Tools

1   Dresden, Saxony
AMAT eMax CT plus chamber:
AMAT eMax CT plus chamber manufactured 12/2002
187745
Applied Materials  

Applied Materials  

AMAT eMax CT plus chamber 

List all items of this typeCluster Plasma Tools - Oxide

in Cluster Plasma Tools

1   Dresden, Saxony
AMAT eMax CT plus chamber:
AMAT eMax CT plus chamber manufactured 12/2002
194911
Applied Materials  

Applied Materials  

Centura e-MAX CT+ 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Taichung, Taichung City
AMAT, Centura e-MAX CT+, 300mm, Oxide Etcher:
AMAT, Centura e-MAX CT+, 300mm, Oxide Etcher


S/N : 414583

!!!MULTIPLE UNITS AVAILABLE!!! Please inquire
192794
Applied Materials  

Applied Materials  

Centura DPS Metal W 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Taichung, Taichung City
AMAT, Centura, DPS II, Metal W Etch, 300mm,:
AMAT, Centura, DPS II, Metal W Etch, 300mm,

Chamber Configuration: 3x DPS II, 1 x Axiom

S/N: 413924

DOM: 2006

Bagged & Skidded in Warehouse

MULTIPLE UNITS AVAILABLE!!!  Please Inquire.
192757
Applied Materials  

Applied Materials  

Centura DPS Poly Etch 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Taichung, Taichung City
AMAT, Centura, DPS II, Poly Etch, 300mm,:
AMAT, Centura, DPS II, Poly Etch, 300mm,

4 Chamber System: 3x DPS II, Poly; 1x Axiom

S/N: 414018

DOM: 2007

Bagged & Skkidded In Warehouse

MULTIPLE UNITS AVAILABLE!!! Please inquire

192485
Amerimade Tech  

Amerimade Tech  

10 FT FAS-ENIG WET PROCESS STATION 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Malta, New York
Amerimade, 10 FT FAS-ENIG WET PROCESS STATION, 300mm:
Amerimade, 10 FT FAS-ENIG WET PROCESS STATION, 300mm

Electroless Nickel Immersion Gold (ENIG) Processing Station

2016

Eagle™ M8 Wet Processing System
Wet Process Station, Manual, Front Access, FM4910, 12 Ft
Control System, PC/PLC Based, No Multi-Tasking
Al Clean - Recirculating/Filtered Bath, NPP, w/ Drain Heat Compatible
  Thermal Circulator, Remote, Air-Cooled, 1.5kW Heating, 0.82kW Cooling
Zincation - Static Bath, Natural Polypropylene, w/ Drain
Acid Clean - Recirculating/Filtered Bath, NPP, w/ Drain Heat Compatible
  Thermal Circulator, Remote, Air-Cooled, 1.5kW Heating, 0.82kW Cooling
E-Less Ni - Heated Recirculating/Filtered, PVDF, w/ Drain
Immersion Gold - Heated Recirculating/Filtered, PVDF, w/ Drain
(3) Quick Dump Dump Rinse Bath, Polypropylene, Dual Dump Door



192483
Amerimade Tech  

Amerimade Tech  

12 FT RAS-PVCC CU ECD SYSTEM 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Malta, New York
Amerimade, 12 FT RAS-PVCC CU ECD SYSTEM, Copper Plating Tool, 300mm:
Amerimade, 12 FT RAS-PVCC CU ECD SYSTEM, Copper Plating Tool, 300mm

Copper (Cu) ElectroChemical Deposition (ECD) Plating System

2016 Vintage
182387
Applied Materials  

Applied Materials  

Enabler, Centura, 4 Chamber Etch 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Dresden, Saxony
Applied Materials, AMAT, Enabler, Centura, 300mm Etch, :
Applied Materials, AMAT, Enabler, Centura, 300mm Etch,

Dry Etch, Bx-, Cx-, E1 layers, 300mm wafers, 32nm BD/SICOH Etch  

MULTIPLE UNITS AVAILABLE:  Please inquire.
193144
Applied Materials  

Applied Materials  

Centura Etch 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Dresden, Saxony
Applied Materials, Centura Etch, 300mm, :
Applied Materials, Centura Etch, 300mm, 

Centura AP Platform

Chambers : 2 x Minos, 1 x Carina, 1 x Axion

S/N : 423383


198214
Applied Materials  

Applied Materials  

Centura WxZ 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Singapore,
Applied Materials, Centura WxZ CVD, Standard, 200mm:
Applied Materials, Centura WxZ CVD, Standard, 200mm

Major Parts Missing.

Bagged & Skidded in Warehouse

S/N: 306010
178356
AMAT  

AMAT  

Centura AP, AdvantEdge G5  

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Dresden, SN
Applied Materials, Etch, AdvantEdge G5, Centura AP, 300mm W Bitline Etch:
Applied Materials, Etch, AdvantEdge G5 2 Chambers, Centura AP Platform,  300mm W Bitline Etch
Dry Etch; Bitline etch 40nm; PL-Etch 40nm; 300mm wafers   
Gases: BCl3, Cl2, CHF3, O2, N2, Ar, CF4, SF6, He, SiCl4, NF3

Tool ID  ETX260
178357
AMAT  

AMAT  

Centura 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   F* Malta, NY
Applied Materials, Etch, Centura Carina Chamber 300mm:
Tool ID : ETX2291-c

Chamber Only.
Carina Etch Chamber.
 Chamber Materials: ADVANCED CERAMIC
Lid Materials:  AG 1000
Process Ring: QUARTZ SINGLE RING
Plasma Exposed Chamber Oring: KALREZ
Cathode Temperature Range: 130 TO 250C
Carina Etch Swap Kit: 1
Chamber Viewport: STANDARD VIEWPORT
Endpoint Type: EyeD IEP
CCM Cover: NO



Location is Malta, NY.
178362
AMAT  

AMAT  

DT HART 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Taichung, Taichung City
Applied Materials, Etch, DT HART , 300mm:
Manufactured in 2006; Status: Bagged and Skidded
195981
Applied Materials  

Applied Materials  

Quantum XP 

List all items of this typeMedium Current Implanters

in Ion Implantation Equipment

1   Dresden, Saxony
Applied Materials, Quantum XP, High Current Ion Implanter, 300mm:
Applied Materials, Quantum XP,  High Current Ion Implanter, 300mm

!!!Multiple Units Available.  Please inquire !!!
183418
ASM  

ASM  

A412 Dual Reactor  

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Malta, New York
ASM A412 Vertical Furnace, 300mm, LPCVD As Doped Poly / TiN:
ASM A412 Vertical Furnace, 300mm, LPCVD As Doped Poly / TiN
Twin LPCVD As Doped Reactors

TOOL ID: FVX2561

Chemistry TiCl4, NH3, NF3, Cl2, SiH4, AsH4

2011 Vintage

 

Tool ID: FVX2561

183417
ASM  

ASM  

A412 Dual Reactor  

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Malta, New York
ASM A412 Vertical Furnace, 300mm, LPCVD As Dpoed Poly / TiN:
ASM A412 Vertical Furnace, 300mm, LPCVD As Dpoed Poly / TiN
Twin LPCVD As Doped Reactors

TOOL ID: FVX2560

Chemistry TiCl4, NH3, NF3, Cl2, SiH4, AsH4

2011 Vintage

 

Tool ID: FVX2560

183169
ASM  

ASM  

A412 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Malta, NY
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN:
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN
Twin LPCVD SiN Reactors

TOOL ID: FVX2541

2011 Vintage
183170
ASM  

ASM  

A412 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Malta, New York
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN:
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN
Twin LPCVD SiN Reactors

TOOL ID: FVX2540

2011 Vintage

 

Tool ID: FVX2541

 
196930
ASM  

ASM  

A300 VT 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Burlington, Vermont
ASM Advance 300 VT, Vertical Furnace, 200mm, Oxidation:
ASM Advance 300 VT,  Vertical Furnace, 200mm, Oxidation

Cold shutdown

Vintage 1997

S/N: 71F5669AE
196931
ASM  

ASM  

A300 VT 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Burlington, Vermont
ASM Advance 300 VT, Vertical Furnace, 200mm, Oxidation:
ASM Advance 300 VT,  Vertical Furnace, 200mm, Oxidation



S/N: 71F5669AC







196932
ASM  

ASM  

A300 VT 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Burlington, Vermont
ASM Advance 300 VT, Vertical Furnace, 200mm, Oxidation:
ASM Advance 300 VT,  Vertical Furnace, 200mm, Oxidation


Cold, Shutdown

S/N: 71F5669AE


195174
ASM  

ASM  

E3200  

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Dresden, Saxony
ASM, E3200, 300mm, Epi Deposition System:
ASM, E3200 Reduced Pressure, 300mm, Epi Deposition System
Epsilon 3200, Epitaxial Reactor

In the fab.

• Gas Loops:
– Nitrogen (N2) purge
– Hydrogen (H2) carrier and purge
– Hydrogen chloride (HCl) wafer and chamber etch
– Primary silicon source, dichlorosilane (SiH2Cl2, gas)
– Low flow hydrogen chloride (HCl)
– Auxiliary silicon source, silane (SiH4)
– Germanium source, germane (GeH4)
• Advanced application valving (for multilayer sharp-transition processing)

195647
ASM  

ASM  

Epsilon 3200 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Dresden, Saxony
ASM, E3200, 300mm, Epi Deposition System:

ASM, E3200 Reduced Pressure, 300mm, Epi Deposition System

Epsilon 3200, Epitaxial Reactor

In the fab.

• Gas Loops:
– Nitrogen (N2) purge
– Hydrogen (H2) carrier and purge
– Hydrogen chloride (HCl) wafer and chamber etch
– Primary silicon source, dichlorosilane (SiH2Cl2, gas)
– Low flow hydrogen chloride (HCl)
– Auxiliary silicon source, silane (SiH4)
– Germanium source, germane (GeH4)
• Advanced application valving (for multilayer sharp-transition processing)

180601
ASML  

ASML  

/300 

List all items of this typeDeep UV Wafer Stepper

in Wafer Steppers

1   F* Temecula, California
ASML /300 DUV Stepper - 6":
ASML /300 - DUV Wafer Stepper - 6" Wafer
Refurbished condition, Lens data taken before decommissioning shows good lens quality.
Currently decomissioned, not available for testing.
Lens under N2 Purge, unit stored in cleanroom.
198212
ASML  

ASML  

PAS5500 /100D 

List all items of this typeDeep UV Wafer Stepper

in Wafer Steppers

1   Singapore,
ASML PAS 5500 - /100D, iLine Stepper, 200mm:
ASML PAS 5500 - /100D, iLine Stepper, 200mm

Bagged & Skidded in Warehouse
137544
Aviza Technology Ltd  

Aviza Technology Ltd  

Aviza Celsior mainframe for 12" / 300 mm 

List all items of this typeBenchtop LPVCD Furnaces

in LPCVD Furnaces

1   F* Regensburg, BY
Aviza Celsior mainframe:
Aviza Celsior mainframe



Aviza Celsior mainframe
Equipment Code: CVD304-04

LOCATION: Dresden
137540
Aviza Technology Ltd  

Aviza Technology Ltd  

Aviza Pantheon Mainframe for 12" / 300 mm 

List all items of this typeBenchtop LPVCD Furnaces

in LPCVD Furnaces

1   F* Regensburg, BY
Aviza Pantheon Mainframe:
Aviza Pantheon Mainframe
Equipment Code: CVD304-03


Aviza Pantheon Mainframe with 3 chambers
Serial Number: OX0412-005
178965
Axcelis Technologies  

Axcelis Technologies  

Optima HDxT 

List all items of this typeMedium Current Implanters

in Ion Implantation Equipment

1   F* Malta, NY
Axcelis Optima HDxT, Ion Implanter, 300mm, :
300mm ion implanter, spare beam tunnel, SRA, PFG, source, manipulator, bushing source flange adapter, source turbo exhaust line, and . chamber liners.

Axcelis Optima HDxT
 
Roughing Pumps:
Edwards IGX100L
Edwards iGX100M
Edwards iGX600M
 
Cryo Pumps:
Qty (2) Brooks: 320FE
Qty (1) Brooks: 250FE
 
Turbo Pump
TP1: Edwards STP-XA2703CV
TP2: Edwards STP-A1303CV
 
Chillers: 
Affinity J Chiller Model: GWN-ZRMK-BE55CBS6
Affinity F-Series Model: FWA-032K-DD19CBD4
 
Cryo Compressors:
Qty (2) Brooks: IS-1000
191094
Dainippon Screen  

Dainippon Screen  

SC-W60A-AV 

List all items of this typeManual Photoresist Coaters

in Photoresist Coaters

2   Villach, Carinthia
B604 SCREEN DNS SCW60B:
Coater with 4 horizontal load ports
2 coater cups
6 resist lines with 3 pumps
8 hot plates (2 of them ADH HP)
2 cool plates
1 temperature controller / unit
192501
Brewer Science  

Brewer Science  

300x 

List all items of this typeI-Line Wafer Stepper

in Wafer Steppers

1   Malta, New York
Brewer Science, 300 X, Resist Coater, 300mm:
Brewer Science,  300 X, Resist Coater, 300mm

Resist Coater
192586
Brewer Science  

Brewer Science  

300XD 

List all items of this typeManual Photoresist Coaters

in Photoresist Coaters

1   Malta, New York
Brewer Science, 300XD, Resist Developer, 300mm:
Brewer Science,  300XD, Resist Developer, 300mm
192500
Brewer Science  

Brewer Science  

CEE 2000 FX 

List all items of this typeI-Line Wafer Stepper

in Wafer Steppers

1   Malta, New York
Brewer Science, CEE 200 FX, Resist Coater, 300mm:
Brewer Science, CEE 200 FX, Resist Coater, 300mm

photoresist coater

192585
Brewer Science  

Brewer Science  

CEE 200 FX 

List all items of this typeManual Photoresist Coaters

in Photoresist Coaters

1   Malta, New York
Brewer Science, CEE 200 FX, Resist Developer, 300mm:
Brewer Science,  CEE 200 FX, Resist Developer, 300mm

Configured for 300mm Square substrates


196933
BTU  

BTU  

7355 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Burlington, Vermont
BTU Bruce, 7355, 200mm, Oxidation, HT and Mid Temp, Horizontal:
BTU Bruce, 7355, 200mm, Oxidation, HT and Mid Temp, Horizontal Fuirnace

S/N: 20F8274AB

1997

Cold, Offline
197661
Canon  

Canon  

FPA-1550 M4-W 

List all items of this typeG-Line Wafer Steppers

in Wafer Steppers

1   N* Villach, Carinthia
178365
Ci Science  

Ci Science  

Torus 300K 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Taichung, Taichung City
Ci Science, Etch, Torus 300K 300mm:
Manufactured in 2005; Status: Bagged and Skidded


!!!MULTIPLE UNITS AVAILABLE!!! Please inquire  
178259
Cressington  

Cressington  

208HR 

List all items of this typeStandalone Sputterers

in Deposition Equipment

1   F* Singapore,
Cressington, Sputtering Systems, :
Manufactured in 1999
195725
Cymer  

Cymer  

EX-5700 

List all items of this typeDeep UV Wafer Stepper

in Wafer Steppers

1   Burlington, Vermont
Cymer, EX-5700, DUV Laser, 248nm, :
Cymer, EX-5700, DUV Laser, 248nm,  

for Nikon NSR-2205Ex14/12 248nm Steppers

S/N : 96CC701812

DOM : 1996
195726
Cymer  

Cymer  

EX-5700 

List all items of this typeDeep UV Wafer Stepper

in Wafer Steppers

1   F* Burlington, Vermont
Cymer, EX-5700, DUV Laser, 248nm, :
Cymer, EX-5700, DUV Laser, 248nm,  

for Nikon NSR-2205Ex14/12 248nm Steppers

S/N : 97CC703710

DOM : 1997
195768
Dainippon Screen  

Dainippon Screen  

SCW-60A-AV 

List all items of this typeManual Photoresist Coaters

in Photoresist Coaters

1   Villach, Carinthia
Dainippon Screen Coater:
Coater with 2 Coatercups
195767
Dainippon Screen  

Dainippon Screen  

SDW-60A-AVP 

List all items of this typeManual Photoresist Developers

in Photoresist Developers

1   Villach, Carinthia
Dainippon Screen Developer:
Developer with 2 Developercups
197510
Dainippon Screen  

Dainippon Screen  

SCW-60A-AV 

List all items of this typeStandard PR Coater Tracks

in Photoresist Coater Tracks

1   F*N* Villach, Carinthia
Dainippon Screen SCW-60A-AV:
Coater with 2 Coatercups
197633
Dainippon Screen  

Dainippon Screen  

SDW-60A-AVP 

List all items of this typeProgrammable Robotic Photoresist Develop Tracks

in Photoresist Develop Track Systems

1   N* Villach, Carinthia
Dainippon Screen SDW-60A-AVP:
Developer with 2 Developercups
196697
Denton  

Denton  

DV-602 C.V. 

List all items of this typeStandalone Sputterers

in Deposition Equipment

1   Burlington, Vermont
Denton Vacuum, Evaporator DV-602 C.V., 200mm, :
Denton Vacuum, Evaporator DV-602 C.V., 200mm, 

_________________________

(2/2018) It was working when it was shut off a few months ago.  It's currently "cold", disconnected and stored in a location a few feet from where it
was installed.  It's complete, has not gone thru any kind of decon, and there are no xtra parts.  There was a slight oil leak at the pump when it was 
shut off.
__________________________
180517
Dainippon Screen  

Dainippon Screen  

SDW-60-AVP 

List all items of this typeStandard Photoresist DevTracks

in Photoresist Develop Track Systems

1   F* Regensburg, BY
Developer DNS SDW-60-AVP:
6 inch developer from dai nippon screen SDW-60-AVP, 2 developing units, full functional
Location: Regensburg, Bavaria
157438
Dainippon Screen  

Dainippon Screen  

SDW60 AVP 

List all items of this typeStandard Photoresist DevTracks

in Photoresist Develop Track Systems

1   F* Regensburg, BY
Developer DNS SDW-60-AVP:
6 inch developer from dai nippon screen SDW-60-AVP, 2 developing units, full functional
195649
Dainippon Screen  

Dainippon Screen  

FC-3000 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Taichung, Taichung City
DNS, Clean / Strip, FC-3000 300mm:
DNS, Clean / Strip, FC-3000 300mm

S/N : 630300249A
194723
Dainippon Screen  

Dainippon Screen  

FC-3000 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Taichung, Taichung City
DNS, Clean / Strip, FC-3000 300mm:
DNS, Clean / Strip, FC-3000 300mm

Process:  R-5-22, IPA/ACT935

S/N: 630300161A


!!!MULTIPLE UNITS AVAILABLE!!! Please inquire


195488
Dainippon Screen  

Dainippon Screen  

FC-3100 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Malta, New York
DNS, Clean / Strip, FC-3100 300mm:
DNS, Clean / Strip, FC-3100 300mm
195495
Dainippon Screen  

Dainippon Screen  

FC-3100 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Malta, New York
DNS, Clean / Strip, FC-3100 300mm:
DNS, Clean / Strip, FC-3100 300mm
178455
DainipponScreen  

DainipponScreen  

SU3000 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Taichung, Taichung City
DNS, Clean / Strip, SU3000 300mm:
SU3000  Manufactured in 2005; Status: Bagged and Skidded
182279
Ebara  

Ebara  

Electroplate UFP-300A 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   East Fishkill, NY
Ebara, 300mm, Plating Plater, Ni Cu PbSn, Lead Tin, Electroplate UFP-300A:
Ebara, 300mm, Plating Plater, Ni Cu PbSn, Lead Tin, Electroplate UFP-300A

Tool ID: PLT01

300mm Wafer Electroplating tool with 3 chemistry capability

TOOL IS MISSING PARTS.  Shutdown 9/2015
182277
Ebara  

Ebara  

Electroplate UFP-200/300A 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   East Fishkill, NY
Ebara, 300mm, Plating Plater, PbSn, Lead Tin, Electroplate UFP-200/300A:
Ebara, 300mm, Plating Plater, PbSn, Lead Tin, Electroplate UFP-200/300A
Tool ID:  PLT02

300mm Wafer Electroplating tool with 3 chemistry capability

TOOL IS MISSING PARTS.  Shutdown 9/2015

197965
ASM  

ASM  

Epsilon 3200 

List all items of this typeEpitaxial Cluster Tools

in Epitaxial Reactors

1   F*N* Villach, Carinthia
EPI ASM:
ASM EPI Epsilon 3200
176318
EVG  

EVG  

EVG850TB/200  

List all items of this typeWafer Fabrication Equipment - Other

in Wafer Fabrication Equipment

1   Regensburg, BY
EVG850 Waferbonder:
EVG850 Waferbonder, Year of Construction 2007
176319
EVG  

EVG  

EVG850TB/200 

List all items of this typeWafer Fabrication Equipment - Other

in Wafer Fabrication Equipment

1   Regensburg, BY
EVG850 waferbonder:
EVG850 Waferbonder year of Construction 2005
176359
EVG  

EVG  

EVG850DB/200  

List all items of this typeWafer Fabrication Equipment - Other

in Wafer Fabrication Equipment

1   Regensburg, BY
EVG850DB/200 Wafer Debonder:
EVG850DB/200  Wafer Debonder for 150mm Wafers
188898
FSI  

FSI  

ORION 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Dresden, Saxony
FSI Orion, TEL, 300mm, Surface Preparation:
FSI Orion, TEL, 300mm, Surface Preparation

EKC
Di Water
dilute HF

Back end process

195385
FSI  

FSI  

Scorpio 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   F* East Fishkill, New York
FSI, Scorpio, Resist Develop Tool, 200mm:
FSI, Scorpio, Resist Develop Tool, 200mm

S/N : S-0850
196207
FSI  

FSI  

Scorpio 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   East Fishkill, New York
FSI, Scorpio, Wet Developer, 200mm,:
FSI, Scorpio, Wet Developer, 200mm,

S/N : S-0849

!! Multiple Units Available !!  Please inquire.


137566
Tokyo Electron Ltd  

Tokyo Electron Ltd  

OfenTel Minibatch (NITRID) for 12" / 300 mm 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Regensburg, BY
Furnace TEL Minibatch (NITRID):
OfenTel Minibatch (NITRID)
Equipment Code: OFE361-01

TEL Formula Minibatch furnace for Nitride, 4


OfenTel Minibatch (NITRID)
Serial Number: P00000315001
137567
Tokyo Electron Ltd  

Tokyo Electron Ltd  

OfenTel Minibatch (OXID) for 12" / 300 mm 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Regensburg, BY
FurnaceTel Minibatch (OXID):
OfenTel Minibatch (OXID)
Equipment Code: OFE361-02

TEL Formula Minibatch furnace for Oxide


OfenTel Minibatch (OXID)
Serial Number: P00000315002
183751
GTX Marketing  

GTX Marketing  

Wet Bench 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Singapore,
GTX Marketing, 200mm, Wet Sink, Support:
GTX Marketing, 200mm, Wet Sink, Support

Tool ID: CPWS-01
190993
Kokusai  

Kokusai  

Quixace Ultimate 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Malta, New York
Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF:

Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF

Low Temp Steam Anneal - for SOD Cure

S/N: T2DD6-18711

190748
Kokusai  

Kokusai  

DJ-1236VN-DF 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Malta, New York
Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF, ALD-TiN:
Kokusai Quixace Ultimate, 300mm,  DJ-1236VN-DF

S/N T2DC6-16590

ALD TiN

Tool is New In Box, with New Quartz.  Never installed.
190749
Kokusai  

Kokusai  

DJ-1236VN-DF 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Malta, New York
Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF, ALD-TiN:
Kokusai Quixace Ultimate, 300mm,  DJ-1236VN-DF

S/N: T2DC6-16595

ALD TiN
180506
Kokusai  

Kokusai  

DJ-1236VN-DF 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Dresden, Saxony
Kokusai Quixace Ultimate, 300mm, MT-TiN, DJ-1236VN-DF:
Kokusai Quixace Ultimate, 300mm, MT-TiN, DJ-1236VN-DF
TiCl4, NH3 - Process for TiN - Prior Use

Cartridge Heater - D4EX22250, RHC2 Heater
Number of control zone, 5 zones
Heater element material - KANTHAL APM
Maximum heating temperature range - 1050 degC (in Furnace)
Flat zone length - 800mm (±2.0 degC at 800 degC)
Main Controller(OU) - D4EX38403(KDSC-2007CONT), Made by HKDE
Core2Duo 2.16GHz, 2.0GB, 80GB (RAID1), 100BASE-TX 3Ch, USB2.0
Main Operation Unit - TM150-HKT05 
Sub Operation Unit - D4EX40577
Bottle Heater (For Ta Source) - E-0456-17, Tokyo Gikken
Bottle Heater (For Ta Source) - E-0456-17, Made by Tokyo Gikken
Bubbling UNIT (For Ti Source) - D4EX31240, Made by Schumacher
Bottle (For Ti Source) - BK1200URK, Made by Schumacher
N2 Purge Load Lock System
O2 Monitor / Detector - SH-305(RX-501052), Made by ENEGY SUPPORT
FOUP Opener N2 Purge SYSTEM - Made by HITACHI KOKUSAI

PUMPS INCLUDED.  See Photo attached.

S/N: T2DC6-15901
194725
Kokusai  

Kokusai  

DD-1206V-DF 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Taichung, Taichung City
Kokusai Quixace, 300mm, DD-1206V-DF:
Kokusai Quixace, 300mm, DD-1206V-DF

LP SiN 

S/N : T2DC6-13303

!!! MULTIPLE UNITS AVAILABLE !!!  Please inquire
190750
Kokusai  

Kokusai  

DD-1223VN 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Malta, New York
Kokusai Quixace, 300mm, DD-1223VN, ALD-TiN:
Kokusai Quixace, 300mm, DD-1223VN

ALD-TiN 

S/N T2DC6-16441
195356
Kokusai  

Kokusai  

DJ-1206VN-DM 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore,
Kokusai Quixace, 300mm, DJ-1206VN-DM, LPCVD SiN:
Kokusai Quixace, 300mm, DJ-1206VN-DM, LPCVD SiN

S/N : T1DC6-13301

Tool is Crated in warehouse in Singapore.

!!!Multiple Units Available!!!  Please inquire
186717
Kokusai  

Kokusai  

DJ-853V 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Singapore,
Kokusai, 200mm, DJ-853V, LPCVD SiN S:
Kokusai, 200mm, DJ-853V, LPCVD SiN 

191535
LAM Research Corp.  

LAM Research Corp.  

2300 ELD 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Dresden, Saxony
LAM, 2300 ELD, WCoP, Electroless Depositon, 300mm:
LAM, 2300 ELD, WCoP, Electroless Depositon, 300mm
191536
LAM Research Corp.  

LAM Research Corp.  

2300 ELD 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Dresden, Saxony
LAM, 2300 ELD, WCoP, Electroless Depositon, 300mm:
LAM, 2300 ELD, WCoP, Electroless Depositon, 300mm

195345
LAM Research Corp.  

LAM Research Corp.  

2300 Exelan Flex 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Taichung, Taichung City
LAM, 2300 Exelan Flex, Etch, 300mm:
LAM, 2300 Exelan Flex,  Etch, 300mm
197417
LAM  

LAM  

Rainbow 4428 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Singapore,
LAM, RAINBOW 4428XL, 200mm , Poly Nitride Etcher:
LAM, RAINBOW 4428XL, 200mm , Poly Nitride Etcher

198372
LAM  

LAM  

TCP 9608SE Metal Etch 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   N* Singapore,
LAM, TCP 9608 METAL ETCHER, 200mm:

LAM, TCP 9608 METAL ETCHER, 200mm

Bagged & Skidded in Warehouse

S/N: 42132


195492
Levitech  

Levitech  

Levitor RTP 

List all items of this typeSingle Chamber RTP Tools

in Production RTP Tools

1   Malta, New York
Levitech, Levitor RTP, 300mm:
Levitech, Levitor RTP, 300mm
190523
Mattson Technology  

Mattson Technology  

SHS2800SF 

List all items of this typeSingle Chamber RTP Tools

in Production RTP Tools

1   Singapore,
Mattson, SHS2800SF, 200mm, RTP:
Mattson, SHS2800SF, 200mm, RTP

S/N: 97040347

TOOL IS MISSING PARTS.
MISSING PARTS --->>>
Location on ToolDESCRIPTIONQty
Machine frontQuartz tube1
Machine frontPRI robot1
Machine frontPRI aligner1
Machine sideAsyst Indexer 22002
Machine hindPRI robot controller1
Machine hindPRI aligner controller1
Machine hindIPC rack1
Machine rightPWM rack1
Machine hindILC rack1
Machine hindPCU rack1
Below furnacePyrometer1
Machine hindGas box1
AccessoriesAccessories 
182331
Steag-Mattson  

Steag-Mattson  

TiW Etch Tool 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Fishkill, NY
Mattson, Steag, TiW Wet Etch Tool, 300mm, :

TiW Wet Etch Tool, Steag, Mattson, 300mm

This tool had two heated TiW Etch tanks, with a quick dump rinse and hot run rinse per tank. It also has two nitrogen dryers. It chemically etched wafers with an active peroxide solution and used a impedance measurement across the wafer to verify etch end­point was reached. The tool was automated to take wafers out of FOUPs and load them into etch racks which were then each moved through a series of tanks. Data collection and SECS GEM is available. *Tool configuration/specification details. (Potential sources are original quotes, configuration

192489
Microtech  

Microtech  

AWB Custom 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Malta, New York
Microtech, 8-ft Acid Wet Bench, Custom, 300mm :
Microtech, 8-ft Acid Wet Bench, Custom, 300mm 

8-ft Acid wet bench with 7 process modules

  • FM4910 approved material construction


2015
192484
Modutek  

Modutek  

Custom Solvent Bench 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Malta, New York
Modutek, Custom 8-ft Solvent Wet Bench, 300mm, :
Modutek, Custom 8-ft Solvent Wet Bench, 300mm, 

2015

8’ Stainless Steel Solvent Station with IPA Vapor Dryer

-     14 gauge, #304 stainless steel construction with real access

-     Stainless steel top decks and tank supports

-          96” long x 72” tall x 48” deep

Left to right

One (1) Modutek IPA Vapor Dryer

-          316L stainless steel main drying tank construction

-          Main drying tank to features cascade/dump rinse and IPA dry feature

-          Drying tank sized for custom 300mm carrier

-          DI water degas unit

-          IPA vapor manifold located in dry tank cover

-          IPA bottle storage (double contained) with air purge and exhaust

-          One (1) gallon IPA container

-          3kW N2, inline heater with low flow switch and high limit thermocouple

 One (1) Modutek Custom DR Series Quick Dump Rinser

        -Rinser to measure 16.0” x 7.5” x 14.0” liquid level              

One (1) Modutek Custom SFa-NH Series (For IPA ambient)

 Stainless Steel Constant Temperature Circulation/Filtration Bath

 -316L stainless steel construction with Freeboard

 -Inside tank dimension (16.0” x 7.5” x 14.0” liquid level)

Two (2) Heated recirculated ultrasonic bath for EKC-265

Constant Temperature Overflow Bath 

 -316L stainless steel construction

 -192 kHz tank frequency with 500 watts total power

 -Sixteen (16) ceramicaly enhanced piezoelectric transducer modules

  -Inside tank dimension (16.0” x 9.5” x 14.0” liquid level)

  -2.0kW heater @ 208vac

 One (1) PLC Controller with Color Touch Screen                       

KFPi CO2 Fire System     

191539
Nanometrics  

Nanometrics  

Q22I 

List all items of this typeLithography Equipment - Other

in Lithography Equipment

1   Singapore,
Nanometrics, Q200I, 200mm,:
Nanometrics, Q200I, 200mm,
Biorad Overlay Tool

!!!MULTIPLE UNITS AVAILABLE!!!  PLEASE INQUIRE

S/N: 200-00-11-02
195517
Nikon  

Nikon  

NSR-2205EX14C 

List all items of this typeDeep UV Wafer Stepper

in Wafer Steppers

1   Singapore,
Nikon, Lithography, NSR-2205EX114C 200mm, DUV Stepper:
Nikon, Lithography, NSR-2205EX14C 200mm, DUV Stepper

!!!Multiple Units Available!!!  Please inquire

Bagged & Skidded in warehouse.

S/N : 7573125

Below is the laser history:
 
D151Total shots 34486
D153F. Window 7035
D154R. Window 7035
D155Chamber  7035
D156MFT  7035
D157O.C  332
D158LNM  33565
D159WSM  33565
D160HVPS  6584
D161Comp. Head 34486
D162Commutator 6952
D163Beam splitter 33565
D165F2 Trap  1478
D167Bearing hour 8097
D79Bandwidth 0.35
D108E. Sigma  1.9
Com Port Status  1TW   
Laser Software Version ELS-5410 v5.1   





186832
Nikon  

Nikon  

NSR-2205Ex12B 

List all items of this typeDeep UV Wafer Stepper

in Wafer Steppers

1   F* Singapore,
Nikon, Lithography, NSR-2205EX12B 200mm:

Nikon, Lithography, NSR-2205EX12B 200mm

197418
Nikon  

Nikon  

NSR-2205EX14C 

List all items of this typeDeep UV Wafer Stepper

in Wafer Steppers

1   Singapore,
Nikon, Lithography, NSR-2205EX14C 200mm, DUV Stepper:
Nikon, Lithography, NSR-2205EX14C 200mm, DUV Stepper

Bagged & Skidded in Warehouse
195997
Nikon  

Nikon  

S204 

List all items of this typeDeep UV Wafer Stepper

in Wafer Steppers

1   Singapore,
Nikon, Lithography, NSR-S204B, DUV Scanner, 200mm:
Nikon, Lithography, NSR-S204B, DUV Scanner,  200mm

Warm Shutdown, in the FAB.

S/N: N5W2101


195529
Nikon  

Nikon  

NSR-S620D 

List all items of this typeDeep UV Wafer Stepper

in Wafer Steppers

1   Dresden, Saxony
Nikon, NSR-S620D, 300mm, ArF Immersion Scanner:
Nikon, NSR-S620D, 300mm, ArF Immersion Scanner

Laser is a Cymer Laser 
 
Laser Model: XLR-640IX 
SN: 41391 
Software Version: 12.8.1
NERD+GLX Option 
NAFFA
 
The Tool is still in production
198242
Novellus Systems  

Novellus Systems  

C3 SPEED MAX 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Malta, New York
Novellus, SPEED MAX, 300mm, HDP CVD:
Novellus, SPEED MAX, 300mm, HDP CVD
2 Chambers
197922
Applied Materials  

Applied Materials  

P5000 

List all items of this typeCluster Plasma Tools - Poly/Nitride

in Cluster Plasma Tools

1   F*N* Villach, Carinthia
P5000 Etch :
P5000 with 3 MxP Poly Etch chambers and ESC Chuck.
191492
Picosun  

Picosun  

Sunale R-200 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   F* East Fishkill, New York
Picosun, Sunale R-200, Advanced ALD Reactor, 200mm:
Picosun, Sunale R-200, Advanced ALD Reactor, 200mm

Configured with three canisters and chemicals to deposit Ni, HfO, Ru and SiO, Al

SUNALETM R-200 Advanced ALD System
The ALD reactor has six separate inlets for precursor sources. It can accommodate up to twelve precursor sources. Maximum deposition temperature of the ALD reactor is 500 °C.

 Vacuum chamber (AISI304)

AISI 304 stainless steel vessel with KF/CF connection flanges for RC-200 reaction chamber.

Reaction Chamber (AISI316L)
RC-200 Chamber and lid with metal sealing surface. Customer specified chamber size up to 8”single Si wafer or smaller wafers (4”, 6”) and pieces

Sample holder SH-200
Substrate holder for one up to 8” wafer or smaller wafers (4”, 6”) and pieces compatible with reaction chamber

Advanced source control and electronics system
Touch panel PC and electronics cabinet used for operating the ALD reactor with Advanced 12-source ALD software and electronics

PicosolutionTM 600 source system

Cooled source systems for high vapor pressure liquid precursors (e.g. for TMA, TiCl4 and H2O). Maximum capacity 600mL. 3ea.

Boosted PicohotTM 200 source system

Heated source systems (up to 200 °C) for low vapor pressure metal precursors (e.g. for TEMAHf, TEMAZr). Suitable also for high vapor pressure chemicals.  2ea.

PicohotTM 300 source system

Heated source system (up to 300 °C) for low vapor pressure metal precursors (e.g. for HfCl4, ZrCl4).  1ea.

PicogasesTM Connection

Allows for the connection of an additional externally supplied compressed gas for use as an ALD precursor (e.g. NH3, O2). Includes plumbing, valves, and control of extra gas source.

DOM:6/18/2013

195178
PSK  

PSK  

SUPRA Vm 

List all items of this typeSingle Wafer Resist Strippers

in Plasma Resist Strippers

1   Malta, New York
PSK, SUPRA Vm, 300mm, Photoresist Strip, 2 Chambers:
PSK, SUPRA Vm, 300mm, Photoresist Strip, 2 Chambers

2013 Vintage,

Stored in warehouse

S/N: PGK13051
195179
PSK  

PSK  

TERA 21  

List all items of this typeSingle Wafer Resist Strippers

in Plasma Resist Strippers

1   F* Singapore,
PSK, TERA21, 300mm, Photoresist strip.:
PSK, TERA21,  300mm, Photoresist strip.

Bagged & Skidded in warehouse


S/N : PTK07021


!!!MULTIPLE UNITS AVAILABLE!!! Please inquire
192499
Quintel  

Quintel  

7000 

List all items of this typeI-Line Wafer Stepper

in Wafer Steppers

1   Malta, New York
QUINTEL, 7000, Mask Aligner, 300mm:
QUINTEL, 7000, Mask Aligner, 300mm

contact mask aligner
192493
Samco  

Samco  

PC-1100 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Malta, New York
SAMCO, PC-1100, Photoresist Striper Asher, 300mm:
SAMCO, PC-1100, Photoresist Striper Asher, 300mm

Parallel plate plasma cleaning system

2013
191530
SANKYO  

SANKYO  

SWH80 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Singapore,
Sankyo, SWH80, WET Etch Bench, Automated, 200mm , Missing Parts Tool :
Sankyo, SWH80, WET  Etch Bench, Automated, 200mm , Missing Parts Tool


Displaying 1-100 of 164  Page  No Previous Page  Show Next Page


*   Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

NOTE:
   photo available
   reference document attached
  F* if the item is specially featured
  N* if the item is newly added, and/or
  R* if the item's price is recently reduced.

Items from the following manufacturers are offered under Wafer Fabrication Equipment:
Accent Optical, Amerimade Technologies, Applied Materials Inc., Applied Materials, Inc., ASM, ASML, Aviza Technology Ltd., Axcelis Technologies GmbH, Brewer Science, BTU, Canon, Ci Science, Cressington, Cymer, Dainippon Screen Mfg. Co., Ltd., Denton, Ebara, EVG, FSI, GTX Marketing, Kokusai, LAM, LAM Research Corp., Levitech, Mattson Technology, Microtech, Modutek, Nanometrics, Nikon, Nikon, Novellus Systems, Picosun, PSK, Quintel, Samco, SANKYO, Scientech, Semi-Tool, Semitool, SEMSYSCO, Shibaura, Silicon Valley Group, Sokudo, Steag-Mattson, Suss MicroTec, Takatori, Tel, TEL Corp., Tokyo Electron Limited, Tokyo Electronics Limited, Ultratech, Inc., Universal Plastics Corporation, Varian, WENESCO