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 Offered (box) or Wanted (coins)  Item ID  Photo Short Description Product Type / Details # Price Notes Location
Make Model
  $  
187746
Applied Materials  

Applied Materials  

AMAT Enabler chamber 

List all items of this typeCluster Plasma Tools - Oxide

in Cluster Plasma Tools

2   F* Dresden, Saxony
2x AMAT Enabler chamber:

ETC380-02-B und ETC380-05-D
AMAT Enabler chamber manufactured 12/2002 und 03/2007

183108
Accent Optical  

Accent Optical  

Caliper Q300 

List all items of this typeLithography Equipment - Other

in Lithography Equipment

1   F* Fishkill, New York
Accent Optical, Caliper Q300, Biorad, 300mm, Overlay Measurement:
Accent Optical, Caliper Q300, Biorad, 300mm, Overlay Measurement

Robotic pick and place wafer transport with two FOUPs

Optics module with variable magnification

High Resolution X,Y,Z & Theta Stage sortware controlled incorporating DSF Autofocus

Programmable Bandwidth Illumination system

Automated Pattern Recognition

Vibration Isolation Table

Fully I300I && GEM/MSEM compliant

GUI and Analysis package running under Lenux

File sharing by LAN

Facilities required:

NPS-208/3ph/60hz @ 20 amps, Facilities connect 3-phase, 5 wire star (3 phases, neu, gnd) rigid isolation base required with 200 mm pass through hole; requires twist-lock outlet and cord cap
Bulk Gases -
Compressed Air - 0.1 scfm @ 84 psi, thru 1/4" push fit, rear connection.  Provide regulator, isolation valve, and guage.
Process Vacuum - 2.1 scfm @ 800 mbar, thru 5/16" push fit, rear connection.  Provide isolation valve and guage
190258
Akrion  

Akrion  

Gama 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   N* Mesa, Arizona
Akrion Gama:
Akrion Gama available from Mesa, AZ facility.
›Serial: 1071-01
›Software Rev: 6.05.009
›GEM/SECS: 3.09
›2 Input Queues
›Tank 1: HF
›Tank 2: DI Rinse
›Tank 3: SC1 (NH4OH, H2O2)
›Tank 4: Rinse
›EE Wash/Dry
›Tank 5: HF/HCl
›Tank 6: DI Rinse with HCl Inject (SC2)
›Tank 7: LuCID I Dryer
›2 Output Queues

LOCATION: Mesa
SERIAL NUMBER(S): 1071-01
187744
Applied Materials  

Applied Materials  

AMAT Axiom strip chamber  

List all items of this typeCluster Plasma Tools - Oxide

in Cluster Plasma Tools

1   Dresden, Saxony
AMAT Axiom strip chamber :
AMAT Axiom strip chamber
187742
Applied Materials  

Applied Materials  

AMAT Centura Rev.4 for 12 " 

List all items of this typeCluster Plasma Tools - Silicon

in Cluster Plasma Tools

1   F* Regensburg, BY
AMAT Centura Rev.4:
AMAT Centura Rev.4
Serial Number: 40 99 39 


AMAT Centura Rev.4 
Serial Number: 40 99 39 
Equipment Code: ETC320-05
AMAT Centura Rev.4;
300mm AMAT Centura Rev.4;
with 2 Load Locks and 2 Load Ports
187743
Applied Materials  

Applied Materials  

AMAT eMax CT chamber  

List all items of this typeCluster Plasma Tools - Oxide

in Cluster Plasma Tools

1   Dresden, Saxony
AMAT eMax CT chamber :
AMAT eMax CT chamber
187745
Applied Materials  

Applied Materials  

AMAT eMax CT plus chamber 

List all items of this typeCluster Plasma Tools - Oxide

in Cluster Plasma Tools

1   Dresden, Saxony
AMAT eMax CT plus chamber:
AMAT eMax CT plus chamber manufactured 12/2002
187747
Applied Materials  

Applied Materials  

AMAT eMax CT plus chamber 

List all items of this typeCluster Plasma Tools - Oxide

in Cluster Plasma Tools

1   Dresden, Saxony
AMAT eMax CT plus chamber:
AMAT eMax CT plus chamber manufactured 12/2002
177729
Applied Materials  

Applied Materials  

P5000 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   F* Regensburg, BY
AMAT P5000 - PE Oxide Dep - 6":
AMAT P5000 - PE Oxide Dep Tool
2 DxZ Chamber - Both PE - Silane 6" Si
Currently Installed in Fab, Good Working Condition
192745
Applied Materials  

Applied Materials  

Centurae-MAX CT+ 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   F* Taichung, Taichung City
AMAT, Centura e-MAX CT+, 300mm, Oxide Etcher:
AMAT, Centura e-MAX CT+, 300mm, Oxide Etcher

S/N: 414580

DOM: 2005

MULTIPLE UNITS AVAILABLE!!!  Please Inquire.
192794
Applied Materials  

Applied Materials  

Centura DPS Metal W 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   N* Taichung, Taichung City
AMAT, Centura, DPS II, Metal W Etch, 300mm,:
AMAT, Centura, DPS II, Metal W Etch, 300mm,

Chamber Configuration: 3x DPS II, 1 x Axiom

S/N: 413924

DOM: 2006

Bagged & Skidded in Warehouse

MULTIPLE UNITS AVAILABLE!!!  Please Inquire.
192757
Applied Materials  

Applied Materials  

Centura DPS Poly Etch 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   N* Taichung, Taichung City
AMAT, Centura, DPS II, Poly Etch, 300mm,:
AMAT, Centura, DPS II, Poly Etch, 300mm,

4 Chamber System: 3x DPS II, Poly; 1x Axiom

S/N: 414018

DOM: 2007

Bagged & Skkidded In Warehouse

MULTIPLE UNITS AVAILABLE!!! Please inquire

192485
Amerimade Tech  

Amerimade Tech  

10 FT FAS-ENIG WET PROCESS STATION 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   N* Malta, New York
Amerimade, 10 FT FAS-ENIG WET PROCESS STATION, 300mm:
Amerimade, 10 FT FAS-ENIG WET PROCESS STATION, 300mm

Electroless Nickel Immersion Gold (ENIG) Processing Station

2016

Eagle™ M8 Wet Processing System
Wet Process Station, Manual, Front Access, FM4910, 12 Ft
Control System, PC/PLC Based, No Multi-Tasking
Al Clean - Recirculating/Filtered Bath, NPP, w/ Drain Heat Compatible
  Thermal Circulator, Remote, Air-Cooled, 1.5kW Heating, 0.82kW Cooling
Zincation - Static Bath, Natural Polypropylene, w/ Drain
Acid Clean - Recirculating/Filtered Bath, NPP, w/ Drain Heat Compatible
  Thermal Circulator, Remote, Air-Cooled, 1.5kW Heating, 0.82kW Cooling
E-Less Ni - Heated Recirculating/Filtered, PVDF, w/ Drain
Immersion Gold - Heated Recirculating/Filtered, PVDF, w/ Drain
(3) Quick Dump Dump Rinse Bath, Polypropylene, Dual Dump Door



192483
Amerimade Tech  

Amerimade Tech  

12 FT RAS-PVCC CU ECD SYSTEM 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   F*N* Malta, New York
Amerimade, 12 FT RAS-PVCC CU ECD SYSTEM, Copper Plating Tool, 300mm:
Amerimade, 12 FT RAS-PVCC CU ECD SYSTEM, Copper Plating Tool, 300mm

Copper (Cu) ElectroChemical Deposition (ECD) Plating System

2016 Vintage
192589
Amerimade Tech  

Amerimade Tech  

2FT IPA VAPOR DRYING STATION 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   F*N* Malta, New York
AmeriMade, 2FT IPA VAPOR DRYING STATION, 300mm:
AmeriMade, 2FT IPA VAPOR DRYING STATION, 300mm

Isopropyl Alcohol (IPA) vapor dryer (Marangoni style)

B-DC-IPALD-M, Bath, Dry Chamber, IPA Liquid Diffusion, Manual, FM4910
• Stand-alone system
• Station hull cunstructed with FM-4910 compatible material
• IPA-based modified surface tension dryer for use in manual wet process tools
• Inner tank assembly includes wafer/liquid sensors and tubing
• IPA dispense system
• Nitrogen heater assembly
• DI water filter housings

192949
Applied Materials  

Applied Materials  

P5000 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   F*N* Singapore,
Applied Materials, AMAT, P5000 Mark II, PECVD, 200mm:
Applied Materials,  AMAT,  P5000 Mark II, PECVD, 200mm

2 Chamber SABPSG 

Has Precision Liquid Injection System with Dual-Tank Liquid Refill System.

Runs SABPSG process, not using Hot Box.


193144
Applied Materials  

Applied Materials  

Centura Etch 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   N* Dresden, Saxony
Applied Materials, Centura Etch, 300mm, :
Applied Materials, Centura Etch, 300mm, 

Centura AP Platform

Chambers : 2 x Minos, 1 x Carina, 1 x Axion

S/N : 423383


194539
Applied Materials  

Applied Materials  

Centura Gigafill CVD 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   F*N* Singapore,
Applied Materials, Centura, Gigafill, CVD, 200mm:
Applied Materials, Centura, Gigafill, CVD, 200mm

Bagged & Skidded in Warehouse

S/N : 21826


178356
AMAT  

AMAT  

Centura AP, AdvantEdge G5  

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Dresden, SN
Applied Materials, Etch, AdvantEdge G5, Centura AP, 300mm W Bitline Etch:
Applied Materials, Etch, AdvantEdge G5 2 Chambers, Centura AP Platform,  300mm W Bitline Etch
Dry Etch; Bitline etch 40nm; PL-Etch 40nm; 300mm wafers   
Gases: BCl3, Cl2, CHF3, O2, N2, Ar, CF4, SF6, He, SiCl4, NF3

Tool ID  ETX260
178357
AMAT  

AMAT  

Centura 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Malta, NY
Applied Materials, Etch, Centura Carina Chamber 300mm:
Tool ID : ETX2291-c

Chamber Only.
Carina Etch Chamber.
 Chamber Materials: ADVANCED CERAMIC
Lid Materials:  AG 1000
Process Ring: QUARTZ SINGLE RING
Plasma Exposed Chamber Oring: KALREZ
Cathode Temperature Range: 130 TO 250C
Carina Etch Swap Kit: 1
Chamber Viewport: STANDARD VIEWPORT
Endpoint Type: EyeD IEP
CCM Cover: NO



Location is Malta, NY.
178362
AMAT  

AMAT  

DT HART 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Taichung, Taichung City
Applied Materials, Etch, DT HART , 300mm:
Manufactured in 2006; Status: Bagged and Skidded
192827
Applied Materials  

Applied Materials  

UltimaX 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   N* Taichung, Taichung City
Applied Materials, Ultima X CVD, 300mm:
Applied Materials, Ultima X CVD, 300mm

Bagged & Skidded in Warehouse

414185


Parts Missing:
qty. 1 HEAT EXCHANGER, SINGLE LOOP, 208V, 50/60
qty. 1 HEAT EXCHANGER, SINGLE LOOP, 208V, 50/60
qty. 1 Generator RF plasma ENI 2MHz/11KWAT( Ultima-x TOP ; Side RF generator)
qty. 1 Generator RF plasma ENI 2MHz/11KWAT( Ultima-x TOP ; Side RF generator)
qty. 1 Generator RF plasma ENI 2MHz/11KWAT( Ultima-x TOP ; Side RF generator)
qty. 1 Generator RF plasma ENI 2MHz/11KWAT( Ultima-x TOP ; Side RF generator)
qty. 1 ASSY, GROUND SHIELD, 300MM ULTIMA X
qty. 1 Side coil assembly

183418
ASM  

ASM  

A412 Dual Reactor  

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Malta, New York
ASM A412 Vertical Furnace, 300mm, LPCVD As Doped Poly / TiN:
ASM A412 Vertical Furnace, 300mm, LPCVD As Doped Poly / TiN
Twin LPCVD As Doped Reactors

TOOL ID: FVX2561

Chemistry TiCl4, NH3, NF3, Cl2, SiH4, AsH4

2011 Vintage

 

Tool ID: FVX2561

183417
ASM  

ASM  

A412 Dual Reactor  

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Malta, New York
ASM A412 Vertical Furnace, 300mm, LPCVD As Dpoed Poly / TiN:
ASM A412 Vertical Furnace, 300mm, LPCVD As Dpoed Poly / TiN
Twin LPCVD As Doped Reactors

TOOL ID: FVX2560

Chemistry TiCl4, NH3, NF3, Cl2, SiH4, AsH4

2011 Vintage

 

Tool ID: FVX2560

183169
ASM  

ASM  

A412 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Malta, NY
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN:
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN
Twin LPCVD SiN Reactors

TOOL ID: FVX2541

2011 Vintage
183170
ASM  

ASM  

A412 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Malta, New York
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN:
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN
Twin LPCVD SiN Reactors

TOOL ID: FVX2540

2011 Vintage

 

Tool ID: FVX2541

 
180601
ASML  

ASML  

/300 

List all items of this typeDeep UV Wafer Stepper

in Wafer Steppers

1   F* Temecula, California
ASML /300 DUV Stepper - 6":
ASML /300 - DUV Wafer Stepper - 6" Wafer
Refurbished condition, Lens data taken before decommissioning shows good lens quality.
Currently decomissioned, not available for testing.
Lens under N2 Purge, unit stored in cleanroom.
194738
ASML  

ASML  

XT-1400E 

List all items of this typeDeep UV Wafer Stepper

in Wafer Steppers

1   N* Taichung, Taichung City
ASML Twinscan XT-1400F ArF, 193nm scanner, 300mm, :
ASML Twinscan XT-1400F ArF, 193nm scanner, 300mm, 

SN : M5215


194739
ASML  

ASML  

XT-1400F 

List all items of this typeDeep UV Wafer Stepper

in Wafer Steppers

1   N* Taichung, Taichung City
ASML Twinscan XT-1400F ArF, 193nm scanner, 300mm, :
ASML Twinscan XT-1400F ArF, 193nm scanner, 300mm, 

S/N : M5417
194740
ASML  

ASML  

XT-1400F 

List all items of this typeDeep UV Wafer Stepper

in Wafer Steppers

1   N* Taichung, Taichung City
ASML Twinscan XT-1400F ArF, 193nm scanner, 300mm, :
ASML Twinscan XT-1400F ArF, 193nm scanner, 300mm, 

S/N : M9794
137544
Aviza Technology Ltd  

Aviza Technology Ltd  

Aviza Celsior mainframe for 12" / 300 mm 

List all items of this typeBenchtop LPVCD Furnaces

in LPCVD Furnaces

1   F* Regensburg, BY
Aviza Celsior mainframe:
Aviza Celsior mainframe



Aviza Celsior mainframe
Equipment Code: CVD304-04

LOCATION: Dresden
137540
Aviza Technology Ltd  

Aviza Technology Ltd  

Aviza Pantheon Mainframe for 12" / 300 mm 

List all items of this typeBenchtop LPVCD Furnaces

in LPCVD Furnaces

1   F* Regensburg, BY
Aviza Pantheon Mainframe:
Aviza Pantheon Mainframe
Equipment Code: CVD304-03


Aviza Pantheon Mainframe with 3 chambers
Serial Number: OX0412-005
178965
Axcelis Technologies  

Axcelis Technologies  

Optima HDxT 

List all items of this typeMedium Current Implanters

in Ion Implantation Equipment

1   F* Malta, NY
Axcelis Optima HDxT, Ion Implanter, 300mm, :
300mm ion implanter, spare beam tunnel, SRA, PFG, source, manipulator, bushing source flange adapter, source turbo exhaust line, and . chamber liners.

Axcelis Optima HDxT
 
Roughing Pumps:
Edwards IGX100L
Edwards iGX100M
Edwards iGX600M
 
Cryo Pumps:
Qty (2) Brooks: 320FE
Qty (1) Brooks: 250FE
 
Turbo Pump
TP1: Edwards STP-XA2703CV
TP2: Edwards STP-A1303CV
 
Chillers: 
Affinity J Chiller Model: GWN-ZRMK-BE55CBS6
Affinity F-Series Model: FWA-032K-DD19CBD4
 
Cryo Compressors:
Qty (2) Brooks: IS-1000
191094
Dainippon Screen  

Dainippon Screen  

SC-W60A-AV 

List all items of this typeManual Photoresist Coaters

in Photoresist Coaters

2   N* Villach, Carinthia
B604 SCREEN DNS SCW60B:
Coater with 4 horizontal load ports
2 coater cups
6 resist lines with 3 pumps
8 hot plates (2 of them ADH HP)
2 cool plates
1 temperature controller / unit
192501
Brewer Science  

Brewer Science  

300x 

List all items of this typeI-Line Wafer Stepper

in Wafer Steppers

1   N* Malta, New York
Brewer Science, 300 X, Resist Coater, 300mm:
Brewer Science,  300 X, Resist Coater, 300mm

Resist Coater
192586
Brewer Science  

Brewer Science  

300XD 

List all items of this typeManual Photoresist Coaters

in Photoresist Coaters

1   N* Malta, New York
Brewer Science, 300XD, Resist Developer, 300mm:
Brewer Science,  300XD, Resist Developer, 300mm
192500
Brewer Science  

Brewer Science  

CEE 2000 FX 

List all items of this typeI-Line Wafer Stepper

in Wafer Steppers

1   N* Malta, New York
Brewer Science, CEE 200 FX, Resist Coater, 300mm:
Brewer Science, CEE 200 FX, Resist Coater, 300mm

photoresist coater

192585
Brewer Science  

Brewer Science  

CEE 200 FX 

List all items of this typeManual Photoresist Coaters

in Photoresist Coaters

1   N* Malta, New York
Brewer Science, CEE 200 FX, Resist Developer, 300mm:
Brewer Science,  CEE 200 FX, Resist Developer, 300mm

Configured for 300mm Square substrates


178365
Ci Science  

Ci Science  

Torus 300K 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Taichung, Taichung City
Ci Science, Etch, Torus 300K 300mm:
Manufactured in 2005; Status: Bagged and Skidded
178259
Cressington  

Cressington  

208HR 

List all items of this typeStandalone Sputterers

in Deposition Equipment

1   F* Singapore,
Cressington, Sputtering Systems, :
Manufactured in 1999
180517
Dainippon Screen  

Dainippon Screen  

SDW-60-AVP 

List all items of this typeStandard Photoresist DevTracks

in Photoresist Develop Track Systems

1   F* Regensburg, BY
Developer DNS SDW-60-AVP:
6 inch developer from dai nippon screen SDW-60-AVP, 2 developing units, full functional
Location: Regensburg, Bavaria
157438
Dainippon Screen  

Dainippon Screen  

SDW60 AVP 

List all items of this typeStandard Photoresist DevTracks

in Photoresist Develop Track Systems

1   F* Regensburg, BY
Developer DNS SDW-60-AVP:
6 inch developer from dai nippon screen SDW-60-AVP, 2 developing units, full functional
194722
Dainippon Screen  

Dainippon Screen  

FC-3000 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   N* Taichung, Taichung City
DNS, Clean / Strip, FC-3000 300mm:
DNS, Clean / Strip, FC-3000 300mm

Process: SC1/SPM

S/N : 630300260A
194723
Dainippon Screen  

Dainippon Screen  

FC-3000 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   N* Santa Clara, California
DNS, Clean / Strip, FC-3000 300mm:
DNS, Clean / Strip, FC-3000 300mm

Process:  R-5-22, IPA/ACT935

S/N: 630300161A



178455
DainipponScreen  

DainipponScreen  

SU3000 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Taichung, Taichung City
DNS, Clean / Strip, SU3000 300mm:
SU3000  Manufactured in 2005; Status: Bagged and Skidded
182279
Ebara  

Ebara  

Electroplate UFP-300A 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   East Fishkill, NY
Ebara, 300mm, Plating Plater, Ni Cu PbSn, Lead Tin, Electroplate UFP-300A:
Ebara, 300mm, Plating Plater, Ni Cu PbSn, Lead Tin, Electroplate UFP-300A

Tool ID: PLT01

300mm Wafer Electroplating tool with 3 chemistry capability

TOOL IS MISSING PARTS.  Shutdown 9/2015
182277
Ebara  

Ebara  

Electroplate UFP-200/300A 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   East Fishkill, NY
Ebara, 300mm, Plating Plater, PbSn, Lead Tin, Electroplate UFP-200/300A:
Ebara, 300mm, Plating Plater, PbSn, Lead Tin, Electroplate UFP-200/300A
Tool ID:  PLT02

300mm Wafer Electroplating tool with 3 chemistry capability

TOOL IS MISSING PARTS.  Shutdown 9/2015

176318
EVG  

EVG  

EVG850TB/200  

List all items of this typeWafer Fabrication Equipment - Other

in Wafer Fabrication Equipment

1   Regensburg, BY
EVG850 Waferbonder:
EVG850 Waferbonder, Year of Construction 2007
176319
EVG  

EVG  

EVG850TB/200 

List all items of this typeWafer Fabrication Equipment - Other

in Wafer Fabrication Equipment

1   Regensburg, BY
EVG850 waferbonder:
EVG850 Waferbonder year of Construction 2005
176359
EVG  

EVG  

EVG850DB/200  

List all items of this typeWafer Fabrication Equipment - Other

in Wafer Fabrication Equipment

1   Regensburg, BY
EVG850DB/200 Wafer Debonder:
EVG850DB/200  Wafer Debonder for 150mm Wafers
188898
FSI  

FSI  

ORION 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Dresden, Saxony
FSI Orion, TEL, 300mm, Surface Preparation:
FSI Orion, TEL, 300mm, Surface Preparation

EKC
Di Water
dilute HF

Back end process

137566
Tokyo Electron Ltd  

Tokyo Electron Ltd  

OfenTel Minibatch (NITRID) for 12" / 300 mm 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Regensburg, BY
Furnace TEL Minibatch (NITRID):
OfenTel Minibatch (NITRID)
Equipment Code: OFE361-01

TEL Formula Minibatch furnace for Nitride, 4


OfenTel Minibatch (NITRID)
Serial Number: P00000315001
137567
Tokyo Electron Ltd  

Tokyo Electron Ltd  

OfenTel Minibatch (OXID) for 12" / 300 mm 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Regensburg, BY
FurnaceTel Minibatch (OXID):
OfenTel Minibatch (OXID)
Equipment Code: OFE361-02

TEL Formula Minibatch furnace for Oxide


OfenTel Minibatch (OXID)
Serial Number: P00000315002
183751
GTX Marketing  

GTX Marketing  

Wet Bench 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Singapore,
GTX Marketing, 200mm, Wet Sink, Support:
GTX Marketing, 200mm, Wet Sink, Support

Tool ID: CPWS-01
190993
Kokusai  

Kokusai  

Quixace Ultimate 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Malta, New York
Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF:

Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF

Low Temp Steam Anneal - for SOD Cure

S/N: T2DD6-18711

190748
Kokusai  

Kokusai  

DJ-1236VN-DF 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Malta, New York
Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF, ALD-TiN:
Kokusai Quixace Ultimate, 300mm,  DJ-1236VN-DF

S/N T2DC6-16590

ALD TiN

Tool is New In Box, with New Quartz.  Never installed.
190749
Kokusai  

Kokusai  

DJ-1236VN-DF 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Malta, New York
Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF, ALD-TiN:
Kokusai Quixace Ultimate, 300mm,  DJ-1236VN-DF

S/N: T2DC6-16595

ALD TiN
180506
Kokusai  

Kokusai  

DJ-1236VN-DF 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Dresden, SN
Kokusai Quixace Ultimate, 300mm, MT-TiN, DJ-1236VN-DF:
Kokusai Quixace Ultimate, 300mm, MT-TiN, DJ-1236VN-DF
TiCl4, NH3 - Process for TiN - Prior Use

Cartridge Heater - D4EX22250, RHC2 Heater
Number of control zone, 5 zones
Heater element material - KANTHAL APM
Maximum heating temperature range - 1050 degC (in Furnace)
Flat zone length - 800mm (±2.0 degC at 800 degC)
Main Controller(OU) - D4EX38403(KDSC-2007CONT), Made by HKDE
Core2Duo 2.16GHz, 2.0GB, 80GB (RAID1), 100BASE-TX 3Ch, USB2.0
Main Operation Unit - TM150-HKT05 
Sub Operation Unit - D4EX40577
Bottle Heater (For Ta Source) - E-0456-17, Tokyo Gikken
Bottle Heater (For Ta Source) - E-0456-17, Made by Tokyo Gikken
Bubbling UNIT (For Ti Source) - D4EX31240, Made by Schumacher
Bottle (For Ti Source) - BK1200URK, Made by Schumacher
N2 Purge Load Lock System
O2 Monitor / Detector - SH-305(RX-501052), Made by ENEGY SUPPORT
FOUP Opener N2 Purge SYSTEM - Made by HITACHI KOKUSAI

S/N: T2DC6-15901
194725
Kokusai  

Kokusai  

DD-1206V-DF 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   N* Taichung, Taichung City
Kokusai Quixace, 300mm, DD-1206V-DF:
Kokusai Quixace, 300mm, DD-1206V-DF

LP SiN 

S/N : T2DC6-13303
190750
Kokusai  

Kokusai  

DD-1223VN 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Malta, New York
Kokusai Quixace, 300mm, DD-1223VN, ALD-TiN:
Kokusai Quixace, 300mm, DD-1223VN

ALD-TiN 

S/N T2DC6-16441
186717
Kokusai  

Kokusai  

DJ-853V 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Singapore,
Kokusai, 200mm, DJ-853V, LPCVD SiN S:
Kokusai, 200mm, DJ-853V, LPCVD SiN 

180736
LAM Research Corp.  

LAM Research Corp.  

4428 Rainbow 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Singapore,
LAM RAINBOW 4428, 200mm, POLY/NITRIDE ETCHER:
LAM RAINBOW 4428, 200mm, POLY/NITRIDE ETCHER
TOOL ID: PNIT-06
S/N: 3734
183764
LAM  

LAM  

RAINBOW 4428XL 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Singapore,
LAM RAINBOW 4428, 200mm, POLY/NITRIDE ETCHER:
LAM RAINBOW 4428XL, 200mm, POLY/NITRIDE ETCHER
TOOL ID: PNIT-03
S/N: 3373

 

Tool ID: PNIT-03

191535
LAM Research Corp.  

LAM Research Corp.  

2300 ELD 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Dresden, Saxony
LAM, 2300 ELD, WCoP, Electroless Depositon, 300mm:
LAM, 2300 ELD, WCoP, Electroless Depositon, 300mm
191536
LAM Research Corp.  

LAM Research Corp.  

2300 ELD 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Dresden, Saxony
LAM, 2300 ELD, WCoP, Electroless Depositon, 300mm:
LAM, 2300 ELD, WCoP, Electroless Depositon, 300mm

191537
LAM Research Corp.  

LAM Research Corp.  

2300 ELD 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Dresden, Saxony
LAM, 2300 ELD, WCoP, Electroless Depositon, 300mm:
LAM, 2300 ELD, WCoP, Electroless Depositon, 300mm
191597
LAM Research Corp.  

LAM Research Corp.  

2300 Stretch ATM + VTM 

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in Plasma Processing Equipment

1   Dresden, Saxony
LAM, 2300, 300mm, Poly etch & Wet Processing:
LAM, 2300, 300mm, Poly etch & Wet Processing
2300 Stretch ATM + VTM

In the Fab.  Cold Shutdown.

S/N: 100638
178368
LAM  

LAM  

2300 Versys W 

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in Plasma Processing Equipment

1   Taichung, Taichung City
LAM, Etch, 2300 Versys W 300mm:
Manufactured in 2005; Status: Bagged and Skidded
180737
LAM Research Corp.  

LAM Research Corp.  

RAINBOW 4428XL 

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in Plasma Processing Equipment

1   Singapore,
LAM, RAINBOW 4428XL, 200mm , Poly Nitride Etcher:
LAM, RAINBOW 4428XL, 200mm , Poly Nitride Etcher
TOOL ID: PNIT-07
S/N: 20102
185290
LAM Research Corp.  

LAM Research Corp.  

Rainbow 4428xl 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   F* Singapore,
LAM, RAINBOW, 4428XL, Nitride Etch, 200mm:
LAM, RAINBOW, 4428XL, Nitride Etch, 200mm
185292
LAM Research Corp.  

LAM Research Corp.  

Rainbow 4428xl 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Singapore,
LAM, RAINBOW, 4428XL, Nitride Etch, 200mm:
LAM, RAINBOW, 4428XL, Nitride Etch, 200mm
194541
LAM  

LAM  

TCP 9608  

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in Plasma Processing Equipment

1   N* Singapore,
LAM, TCP 9608 METAL ETCHER, 200mm:

LAM, TCP 9608 METAL ETCHER, 200mm
Aluminum Etching System

!!!MULTIPLE UNITS AVAILABLE!!!  Please inquire

S/N : 4470

194542
LAM  

LAM  

TCP 9608 Metal Etch 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   N* Singapore,
LAM, TCP 9608 METAL ETCHER, 200mm:

LAM, TCP 9608 METAL ETCHER, 200mm

Aluminum Etching System

S/N : 4696


!!!MULTIPLE UNITS AVAILABLE!!!  Please inquire

192950
Mattson Technology  

Mattson Technology  

Aspen2 

List all items of this typeSingle Wafer Resist Strippers

in Plasma Resist Strippers

1   Singapore,
Mattson, Aspen2, 200mm, Triode Photoresist Stripper:
Mattson,Aspen2,200mm, Triode Photoresist Stripper

Bagged & Skidded in Warehouse

S/N : 204


193335
Mattson Technology  

Mattson Technology  

Helios 

List all items of this typeSingle Chamber RTP Tools

in Production RTP Tools

1   N* Singapore,
Mattson, Helios, 300mm, RTP:
Mattson, Helios, 300mm, RTP
182331
Steag-Mattson  

Steag-Mattson  

TiW Etch Tool 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Fishkill, NY
Mattson, Steag, TiW Wet Etch Tool, 300mm, :

TiW Wet Etch Tool, Steag, Mattson, 300mm

This tool had two heated TiW Etch tanks, with a quick dump rinse and hot run rinse per tank. It also has two nitrogen dryers. It chemically etched wafers with an active peroxide solution and used a impedance measurement across the wafer to verify etch end­point was reached. The tool was automated to take wafers out of FOUPs and load them into etch racks which were then each moved through a series of tanks. Data collection and SECS GEM is available. *Tool configuration/specification details. (Potential sources are original quotes, configuration

192489
Microtech  

Microtech  

AWB Custom 

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in Wet Processing Equipment

1   N* Malta, New York
Microtech, 8-ft Acid Wet Bench, Custom, 300mm :
Microtech, 8-ft Acid Wet Bench, Custom, 300mm 

8-ft Acid wet bench with 7 process modules

  • FM4910 approved material construction


2015
192677
MIVA  

MIVA  

20128 Mask Writer 

List all items of this typeLithography Equipment - Other

in Lithography Equipment

1   N* Malta, New York
MIVA, 20128, MASK WRIGHTER:
MIVA, 20128, MASK WRIGHTER
Maskless Exposure tool
192484
Modutek  

Modutek  

Custom Solvent Bench 

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in Wet Processing Equipment

1   F*N* Malta, New York
Modutek, Custom 8-ft Solvent Wet Bench, 300mm, :
Modutek, Custom 8-ft Solvent Wet Bench, 300mm, 

2015
191539
Nanometrics  

Nanometrics  

Q22I 

List all items of this typeLithography Equipment - Other

in Lithography Equipment

1   Singapore,
Nanometrics, Q200I, 200mm,:
Nanometrics, Q200I, 200mm,
Biorad Overlay Tool

S/N: 200-00-11-02
192253
Tokyo Electron Ltd  

Tokyo Electron Ltd  

Stratus S200 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   N* Villach, Carinthia
NEXX Stratus 200:

Stratus 200 is high volume manufacturing electroplating system for advanced wafer level packaging (WLP) applications

186832
Nikon  

Nikon  

NSR-2205Ex12B 

List all items of this typeDeep UV Wafer Stepper

in Wafer Steppers

1   Singapore,
Nikon, Lithography, NSR-2205EX12B 200mm:

Nikon, Lithography, NSR-2205EX12B 200mm

191492
Picosun  

Picosun  

Sunale R-200 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   N* East Fishkill, New York
Picosun, Sunale R-200, Advanced ALD Reactor, 300mm:
Picosun, Sunale R-200, Advanced ALD Reactor, 300mm

Configured with three canisters and chemicals to deposit Ni, HfO, Ru and SiO, Al

SUNALETM R-200 Advanced ALD System
The ALD reactor has six separate inlets for precursor sources. It can accommodate up to twelve precursor sources. Maximum deposition temperature of the ALD reactor is 500 °C.

 Vacuum chamber (AISI304)

AISI 304 stainless steel vessel with KF/CF connection flanges for RC-200 reaction chamber.

Reaction Chamber (AISI316L)
RC-200 Chamber and lid with metal sealing surface. Customer specified chamber size up to 8”single Si wafer or smaller wafers (4”, 6”) and pieces

Sample holder SH-200
Substrate holder for one up to 8” wafer or smaller wafers (4”, 6”) and pieces compatible with reaction chamber

Advanced source control and electronics system
Touch panel PC and electronics cabinet used for operating the ALD reactor with Advanced 12-source ALD software and electronics

PicosolutionTM 600 source system

Cooled source systems for high vapor pressure liquid precursors (e.g. for TMA, TiCl4 and H2O). Maximum capacity 600mL. 3ea.

Boosted PicohotTM 200 source system

Heated source systems (up to 200 °C) for low vapor pressure metal precursors (e.g. for TEMAHf, TEMAZr). Suitable also for high vapor pressure chemicals.  2ea.

PicohotTM 300 source system

Heated source system (up to 300 °C) for low vapor pressure metal precursors (e.g. for HfCl4, ZrCl4).  1ea.

PicogasesTM Connection

Allows for the connection of an additional externally supplied compressed gas for use as an ALD precursor (e.g. NH3, O2). Includes plumbing, valves, and control of extra gas source.

DOM:6/18/2013

192499
Quintel  

Quintel  

7000 

List all items of this typeI-Line Wafer Stepper

in Wafer Steppers

1   N* Malta, New York
QUINTEL, 7000, Mask Aligner, 300mm:
QUINTEL, 7000, Mask Aligner, 300mm

contact mask aligner
192493
Samco  

Samco  

PC-1100 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   N* Malta, New York
SAMCO, PC-1100, Photoresist Striper Asher, 300mm:
SAMCO, PC-1100, Photoresist Striper Asher, 300mm

Parallel plate plasma cleaning system

2013
187756
SANKYO  

SANKYO  

SWH80 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Singapore,
SANKYO, SWH80, 200mm, Wet Bench, Salicide Strip:
SANKYO, SWH80, 200mm, Wet Bench, Salicide Strip
In the fab
191530
SANKYO  

SANKYO  

SWH80 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Singapore,
Sankyo, SWH80, WET Etch Bench, Automated, 200mm , Missing Parts Tool :
Sankyo, SWH80, WET  Etch Bench, Automated, 200mm , Missing Parts Tool


189086
SANKYO  

SANKYO  

SWH80 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Singapore,
Sankyo, SWH80, WET Oxide Etch Bench, Automated, 200mm :
Sankyo, SWH80, WET Oxide Etch Bench, Automated, 200mm 

In the FAB
178376
Scientech  

Scientech  

OXIDE ETCH 8" 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Singapore,
Scientech, Etch, OXIDE ETCH 8" 200mm:
Status: Bagged and Skidded
182276
Semitool  

Semitool  

R_310_FMC2 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   East Fishkill, New York
Semitool, 300mm, Electro Etch, Raider, R 310 FMC2, :
Semitool, 300mm, Electro Etch, Raider, R 310 FMC2


Tool ID: ELE01,


178457
Semi-Tool  

Semi-Tool  

Raider GT ECD 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Malta, NY
Semitool, Plating, Raider ECD 300mm:
Raider ECD Copper Plating Tool
TOOL ID:  MPX2600
S/N : T239604

MULTIPLE UNITS AVAILABLE PLEASE INQUIRE
186258
SEMSYSCO  

SEMSYSCO  

Galaxy 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Dresden, SN
SEMSYSCO, GALAXY, 300mm, Batch Resist Strip Tool, Solvent Strip:
SEMSYSCO, GALAXY, 300mm, Batch Resist Strip Tool, Solvent Strip Tool

2 x CRD-Chambers (Chemistry Rinse & Dry) Chambers

2 x SRD-Chambers (Spin, Rinse &  Dry) Chambers

 Staeubli Robot

6 x FOUP Loadports

182416
Shibaura  

Shibaura  

CDE300  

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Malta, New York
Shibaura, CDE300, 300mm, Isotropic Chemical Dry Etch:
Shibaura, CDE300, 300mm, Isotropic Chemical Dry Etch

Chemistries O2, CF4, Cl2, Ar

Tool ID: ETX2390
178722
Sokudo  

Sokudo  

RF-300A 

List all items of this typeManual Photoresist Coaters

in Photoresist Coaters

1   Taichung, Taichung City
178335
Sokudo  

Sokudo  

RF-300A 

List all items of this typeManual Photoresist Coaters

in Photoresist Coaters

1   Taichung, Taichung City
Sokudo, RF-300A Photoresist, 300mm:
Manufactured in 2007; Status: Bagged and Skidded
188431
Aviza Technology Ltd  

Aviza Technology Ltd  

AVP 8000 AP 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore,
SVG, AVP 8000 AP, 200mm Vertical Furnace:
SVG, AVP 8000 AP, 200mm Vertical Furnace
Cu Anneal




S/N 4250
188435
Aviza Technology Ltd  

Aviza Technology Ltd  

AVP 8000 AP 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore,
SVG, AVP 8000 AP, 200mm Vertical Furnace:
SVG, AVP 8000 LP, 200mm Vertical Furnace

Padox/Sacri-Ox

S/N: 4318
189077
Silicon Valley Group  

Silicon Valley Group  

AVP 8000 AP 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore,
SVG, AVP 8000 AP, 200mm Vertical Furnace:
SVG, AVP 8000 AP, 200mm Vertical Furnace

Padox/Sacri-Ox

Bagged & Skidded in Warehouse


191257
Silicon Valley Group  

Silicon Valley Group  

AVP 8000, AP, Forming Gas Anneal 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore,
SVG, AVP 8000 AP, 200mm Vertical Furnace, Forming Gas Anneal:
SVG, AVP 8000 AP, 200mm Vertical Furnace, Forming Gas Anneal

S/N: 4437
191913
Silicon Valley Group  

Silicon Valley Group  

AVP 8000 AP 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore,
SVG, AVP 8000 AP, 200mm Vertical Furnace, Gate Oxidation:

SVG, AVP 8000 AP, 200mm Vertical Furnace, Gate Oxidation

Bagged & Skidded in Warehouse


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*   Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

NOTE:
   photo available
   reference document attached
  F* if the item is specially featured
  N* if the item is newly added, and/or
  R* if the item's price is recently reduced.

Items from the following manufacturers are offered under Wafer Fabrication Equipment:
Accent Optical, Akrion, Amerimade Technologies, Applied Materials, Inc., ASM, ASML, Aviza Technology Ltd., Axcelis Technologies GmbH, Brewer Science, Ci Science, Cressington, Dainippon Screen Mfg. Co., Ltd., Ebara, EVG, FSI, GTX Marketing, IPEC/Westech, Kokusai, LAM, LAM Research Corp., Mattson Technology, Microtech, MIVA, Modutek, Nanometrics, Nikon, Picosun, Quintel, Samco, SANKYO, Scientech, Semi-Tool, Semitool, SEMSYSCO, Shibaura, Silicon Valley Group, Sokudo, Steag-Mattson, Tel, TEL Corp., Tokyo Electron Limited, Tokyo Electronics Limited, Ultratech, Inc., Universal Plastics Corporation, Varian, Watkins-Johnson, WENESCO