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Lithography Equipment


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 Automated Coating and Developing Cluster System  in Photoresist Coater/Developers  (no items)

 Contact/Proximity Mask Aligners  in Mask Aligners  (no items)

 Deep UV Wafer Stepper  in Wafer Steppers  (10)

 G-Line Wafer Steppers  in Wafer Steppers  (no items)

 Hybrid Mask Aligners  in Mask Aligners  (no items)

 I-Line Wafer Stepper  in Wafer Steppers  (5)

 Lithography Equipment - Other  in Lithography Equipment  (3)

 Lithography Exposure Tools - Other  in Exposure Tools  (no items)

 Manual Photoresist Coaters  in Photoresist Coaters  (18)

 Manual Photoresist Developers  in Photoresist Developers  (1)

 Photoresist Curing Tools  in Photoresist Tools  (no items)

 Photoresist Prime Tools  in Photoresist Tools  (no items)

 Programmable Robotic Photoresist Develop Tracks  in Photoresist Develop Track Systems  (no items)

 Programmable Robotic Track Systems  in Photoresist Coater/Developers  (no items)

 Projection Mask Aligners  in Mask Aligners  (no items)

 Robotic PR Coater Tracks  in Photoresist Coater Tracks  (no items)

 Standard Photoresist DevTracks  in Photoresist Develop Track Systems  (2)

 Standard PR Coater Tracks  in Photoresist Coater Tracks  (no items)

 Standard PR Track Systems  in Photoresist Coater/Developers  (no items)

 Xray Wafer Stepper  in Wafer Steppers  (no items)

Items from the following manufacturers are offered under Lithography Equipment:
Accent Optical, ASML, Brewer Science, Cymer, Dainippon Screen Mfg. Co., Ltd., MIVA, Nanometrics, Nikon, Nikon, Quintel, Silicon Valley Group, Sokudo, Suss MicroTec, Tel, Tokyo Electron Limited, Tokyo Electronics Limited, Ultratech, Inc., WENESCO