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Other Plasma Processing Equipment and Tools


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Item IDItem DescriptionDescriptionCondition#PriceNotes Location
MakeModel
$
248647 Applied Materials CenturaMetal Etch 1 N* Singapore
248240 Ebara F-REX300EBARA/F-REX-300/CMP TUNGSTEN 1 East Fishkill, New York
244283 FEI Helios NanoLab 1200HPFailure Analysis 1 Malta, New York
248648 Gasonics PEP-4800DLHIO process 1 N* Singapore
204280 Hitachi M-8190XTDielectric Etch (spacer) 1 Malta, New York
239809 LAM Research Corp. 2300MainframeGood 1 Villach, Carinthia
219677 LAM Research Corp. INOVACu Barrier Seed depostion 1 Malta, New York
245286 LAM Research Corp. Rainbow 4428ISO Etch 1 Singapore
245285 LAM Research Corp. TCP9408SEPoly Etch non WAC 1 Singapore
241157 Mattison MILLIOS HVM 1 Malta, New York
239647 Novellus Systems INOVA NEXT 1 Malta, New York
244285 Oxford Instruments OPALRF/Plasma oxide deposition tool 1 Malta, New York
240477 SOLVISION PRECIS 3D
SOLVISION, PRECIS 3D, s/n: C1W010150609:

SOLVISION, PRECIS 3D, s/n: C1W010150609

1 F* Dresden, Saxony
245287 Tokyo Electron Limit TE8500Contact Etch 1 Singapore

NOTE:
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   reference document attached
  F* if the item is specially featured
  N* if the item is newly added, and/or
  R* if the item's price is recently reduced.

Items from the following manufacturers are offered under Other Plasma Processing Equipment and Tools:
Applied Materials, Inc., Ebara, FEI, Gasonics, Hitachi, LAM Research Corp., Mattison, Novellus Systems, Oxford Instruments, SOLVISION, Tokyo Electron Limited