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	View All Listings Under Chemical Vapor Deposition Equipment » Switch Major Category		Click an item's ID# below for its full specifications and source, or: Group Listings into sub-categories under Chemical Vapor Deposition Equipment List all 11 product types under Chemical Vapor Deposition Equipment

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Item ID  Photo Short Description Product Type / Details # Price Notes Location Make Model   $   245275 Applied Materials   Applied Materials   EPI5  Epitaxial Cluster Tools in Epitaxial Reactors AMAT EPI CENTURA HTF (EPI5): Software Ver: B6.30 CB1 Amps: 300A SBC Type: V452 Flow Point Model: Nano Valve Gas Panel Type: Configurable Wafer Size: 200mm (with conversion kit 150mm is possible) M-Monitor: CRT 3 Chambers ATM EPI With digital Flow-Control of the cooling systems with interlock and passphrase (Simens PLC) HDD was upgraded to RAID System Tool called "EPI5" 1   Villach, Carinthia 218746 Applied Materials   Applied Materials   P5000  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment Amat P5000 CVD Tool: P500048 8 inch tool with 4 CVD chambers. Tool still in Production until (Planned until 3.23)  1   Villach, Carinthia 245288 AMAT   AMAT   P5000  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment AMAT, P5000, 200mm, S/N 4862: AMAT, P5000, 200mm, S/N 4862 1   Singapore 246605 Applied Materials   Applied Materials   Ultima CENTURA DCVD  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment AMAT, Ultima CENTURA DCVD, 200mm, S/N 302959: AMAT, Ultima CENTURA DCVD, 200mm, S/N 302959 2 chms.    1   Singapore 242019 ATV Technologie GmbH   ATV Technologie GmbH   PEO 602  Horizontal LPCVD Furnaces in LPCVD Furnaces ATV PEO 602 tube furnace: This furnace can handle wafers up to 150mm Configuration: N2 -  1500 l/min N2 -    660 l/min Forming Gas 660l/min Temperature Control 0°C – up to 500°C max. Free Ramping (up to 99 steps max., one step up to 99,99 °C max.) Stainless Steel Calotte 0 – 5kg 1   Warstein, North Rhine-Westphalia 242018 ATV Technologie GmbH   ATV Technologie GmbH   PEO 603  Horizontal LPCVD Furnaces in LPCVD Furnaces ATV PEO 603 tube furnace : This furnace can handle wafers up to 150mm Configuration: N2 -  1500 l/min N2 -    660 l/min Forming Gas 660l/min Temperature Control 0°C – up to 500°C max. Free Ramping (up to 99 steps max., one step up to 99,99 °C max.) Stainless Steel Calotte 0 – 5kg 1   Warstein, North Rhine-Westphalia 202834 Kokusai   Kokusai   DJ-1236VN-DF  Vertical LPCVD Furnaces in LPCVD Furnaces HITACHI KOKUSAI, DJ-1236VN-DF, 300mm: HITACHI KOKUSAI, DJ-1236VN-DF, 300mm 1   Malta, New York 243313 Hitachi Kokusai Elec   Hitachi Kokusai Elec   DJ-1236VN-DF  Vertical LPCVD Furnaces in LPCVD Furnaces HITACHI KOKUSAI, DJ-1236VN-DF, 300mm, s/n: DN23300, FVX2488: HITACHI KOKUSAI, DJ-1236VN-DF, 300mm, FVX2488 Vertical LPCVD Furnace 1   Malta, New York 219675 LAM Research Corp.   LAM Research Corp.   Vector Express  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment LAM, Vector Express, 300mm, S/N D22437A, Ashable Hard Mask CVD: LAM, Vector Express, 300mm, S/N D22437A, Ashable Hard Mask CVD 1   Malta, New York 223074 Novellus Systems   Novellus Systems   Concept Two SPEED  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment Novellus Concept Two SPEED (shrink): 1 Mainframe w/ 3 Chambers  Damages/Deficites: Chamber Turbo Pumps & HF/LF Generators  EOL: Turbo Pumps   no significant failures between last 3 years 1   Dresden, Saxony 238827 Applied Materials   Applied Materials   P5000  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment P5000: From Chamber B following Parts are missing: RF Generator RF Match Baratron Turbo/Controller Chamber B,C,D are universal CVD etch chambers. 1   Villach, Carinthia 240853 Applied Materials   Applied Materials   P5000  Chemical Vapor Deposition Equipment - Other in Chemical Vapor Deposition Equipment P5000: 4x Standard SNIT Chambers 1   Villach, Carinthia 242656 Applied Materials   Applied Materials   P5000  Cluster PECVD Tools in Production Tools P5000: CHAMBER A  Universal CVD Teos CHAMBER B  Universal CVD Teos CHAMBER C Mark2 Etch CHAMBER D Mark2 Etch The Tool is sold with 4 chambers and was productiv until August 2023 1   Villach, Carinthia 242682 Applied Materials   Applied Materials   P5000  Cluster PECVD Tools in Production Tools P5000: CHAMBER A  x   Universal CVD Teos CHAMBER B  x   Universal CVD Teos CHAMBER D x   Universal CVD Teos Tool is sold with three chambers and was used in cleanroom until August 2023 1   Villach, Carinthia

*   Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

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Items from the following manufacturers are offered under Chemical Vapor Deposition Equipment: AMAT, Applied Materials, Inc., ATV Technologie GmbH, Hitachi Kokusai Elec, Kokusai, LAM Research Corp., Novellus Systems