|
Item ID |
Photo |
Short Description |
Product Type / Details |
#
|
Price |
Notes |
Location |
Make |
Model |
|
|
$ |
|
|
247608
|
ASML
|
ASML |
XT1900GI |
in Wafer Steppers
ASML, XT1900GI, 300mm, S/N 4210:ASML, XT1900GI, 300mm, S/N 4210 The cymer laser is EOL.
|
1
|
|
|
|
Singapore |
|
|
243575
|
Axcelis Technologies
|
Axcelis Technologies |
Optima MD |
in Wafer Steppers
Axcelis, Optima MD, 300mm, s/n: 083015, IMP205:Axcelis, Optima MD, 300mm, s/n: 083015 Medium Current Implant
|
1
|
|
|
|
Dresden, Saxony |
|
|
210404
|
Suss MicroTec
|
Suss MicroTec |
Falcon Polyimid Developer |
in Photoresist Develop Track Systems
Fairchild Developer Ent3C:Developer with 2 chambers for spray developing.
|
1
|
|
|
|
Villach, Carinthia |
|
|
248320
|
Nikon
|
Nikon |
NSR-2205EX14C |
in Wafer Steppers
Nikon, NSR-2205EX14C, 200mm, S/N 7573120:Nikon, NSR-2205EX14C, 200mm, S/N 7573120
|
1
|
|
|
|
Singapore |
|
|
245214
|
Nikon
|
Nikon |
NSR-S208D |
in Wafer Steppers
Nikon, NSR-S208D, 300mm, S/N 8732041:Nikon, NSR-S208D, 300mm, S/N 8732041
|
1
|
|
|
|
Singapore |
|
|
247027
|
Nikon
|
Nikon |
NSR-S208D |
in Wafer Steppers
NIKON, NSR-S208D, 300mm, s/n: 8732048:NIKON, NSR-S208D, 300mm, s/n: 8732048 Lithography Step and repeat scanning system
|
1
|
|
|
|
Dresden, Saxony |
|
|
247605
|
Nikon
|
Nikon |
NSR-S208D |
in Wafer Steppers
NIKON, NSR-S208D, 300mm, s/n: S62 0290202:Lithography Step and repeat scanning system
|
1
|
|
|
|
Dresden, Saxony |
|
|
248241
|
Suss Tamarack Scient
|
Suss Tamarack Scient |
TAMARACK M423 EXCIMER |
in Wafer Steppers
|
1
|
|
|
|
East Fishkill, New York |
|
|
245281
|
Tel
|
Tel |
Lithius Pro i |
in Photoresist Coaters
TEL Lithius Pro i, 300mm, s/n: N100463, TRK1372:TEL Lithius Pro i, 300mm, s/n: N100463, TRK1372 Coater/Developer Tool
|
1
|
|
|
|
Dresden, Saxony |
|
|
246930
|
Tel
|
Tel |
Lithius |
in Photoresist Coaters
TEL Lithius, sn: G391405 ,300 mm, TRK1420, KrF Litho:TEL Lithius, sn: G391405 ,300 mm, TRK1420 (ALC1420TRK)
|
1
|
|
|
|
Dresden, Saxony |
|
|
241022
|
Tel
|
Tel |
Lithius |
in Photoresist Coaters
TEL Lithius, sn: MDG160683, ,300 mm:Coat only Tool
|
1
|
|
|
|
Dresden, Saxony |
|
|
248322
|
Tokyo Electron Ltd
|
Tokyo Electron Ltd |
ACT8 |
in Photoresist Coaters
TEL, ACT8, 200mm, S/N 9101291:TEL, ACT8, 200mm, S/N 9101291
|
1
|
|
|
|
Singapore |
|
|
247197
|
Tel
|
Tel |
LITHIUS PRO V |
in Photoresist Coaters
TEL, LITHIUS PRO V, 300mm, sn: V110263, HM05:TEL, LITHIUS PRO V, 300mm, sn: V110263, Immersion Coater/Dev
|
1
|
|
|
|
East Fishkill, New York |
|
|
247606
|
Tel
|
Tel |
LITHIUS |
in Photoresist Coaters
TEL, LITHIUS, 300mm, sn: MDG350168:2-Block-Machine
|
1
|
|
|
|
Dresden, Saxony |
|
|
245289
|
Tokyo Electron Limit
|
Tokyo Electron Limit |
8181523 |
in Photoresist Coaters
TEL, Mark 8, 200mm, S/N 8181523:TEL, Mark 8, 200mm, S/N 8181523 SOG Coater. 2 coaters only.
|
1
|
|
|
|
Singapore |
|
|
|