Plasma-Therm 790 Reactive Ion Etcher - Remaufactured with ECT Upgrade
PLASMA-THERM 790 Reactive Ion Etcher; Serial Number PTI-78272F
- Manually Loaded Process Chamber with 8” (dia.) Cathode
- Gas Distribution Panel with 4ea Gas Channels
- MKS 1479 Metal Sealed Mass Flow Controllers
- 4ea Additional Gas Channels Available
- RFPP RF5S RF Generator: 500W @ 13.56MHz
- RFPP AMN-5 Auto Matching Network
- RFPP AMNPS-2A Auto Matching Network Controller
- Leybold TMP 361 Turbomolecular Pump
- Leybold NT 150/360 Turbomolecular Pump Controller
- EquipmentWorks 2.6 Application SW
- Industrial PC Running UBUNTU LINUX OS, Intel I7 CPU at 3.4 GHz,16Gb RAM & 500GB SSD
- All Analog & Digital I/O Modules Controlled by BECKHOFF Ethernet I/O Via Modbus TCP/IP Communications Protocol.
- All I/O Modules Available from BECKHOFF Automation and are Plug & Play Compatible
- All Pneumatic Valves Controlled by SMC Modules Via Modbus TCP/IP Communications Protocol
- All SMC Pneumatic Valves Available from SMC USA
- Standard 21” Flat Panel Monitor, Keyboard & Mouse
- Edwards QDP40 Dry Roughing Pump
- NESLAB HX-75 Chiller
- Electrical Disconnect Box - 208V, 60Hz, 3 Ph
- System Fully Refurbished & Ready for Demonstration
- Guaranteed to Meet or Exceed OEM Specifications
- Price……$ 80,000.00 USD
1 unit @ $80,000.00
MAKE: Plasma-Therm
MODEL: 790
CATEGORY: Other Etchers
SELLER: Catalyst Equipmt Co
Plano, TX US
SPECS
| Manufacturer | Plasma-Therm |
| Model | 790 |
| Wafer Size Range | |
| Minimum | 75 mm |
| Maximum | 200 mm |
| Process | Reactive Ion Etching |
| Controller Type | PC Controller Type |
| Software Revision Level | ECT |
| Interface | Other |
| High Vacuum Pump | Leybold TMP361 |
| Roughing Pump | Edwards QDP40 |
| RF Generator Model | RFPP RF5S |
| Number of Gas Inputs | Four Gas |
| Chillers | |
| Number of Chillers | 1 |
| Chiller #1Manufacturer/Model | Neslab HX-75 |
| Power Requirements | 208 V 60 Hz 3 Phase |
| Refurbished | YES |
| Condition | Like New |
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