EVG Lithoscale - Maskless Exposure System

Up to 300mm, Low-Volume Manufacturing, automated substrate handling

Brandnew and unsed System available for an attractive price!

Out of package Hyperion

Technical configuration:

• For maskless exposure of wafer sizes up to 300 mm

• High precision stage including contactless wedge error compensation

• Self calibration via integrated sensors

• Extensibility up to two (2) exposure heads in total for highest throughput

• Separate control unit

• EVG CIM Framework software

• Self diagnostics during machine start up, automatic initialization of all motors, position end switches, sensors and pneumatic

• Inspection available on request

• PC controlled operating environment

• Solid state drive and hard drive for high availability and reliability

• Supported layout format: GDSII