Automated Coating and Developing Cluster System
SUSS MICROTEC FALCON ACS 200
Fully Automated High Throughput Coating, Developing Cluster System System configured for Anti-reflective coating (A.R.C) and Ebeam Resist.
Coating and lithography systems are essential in the semiconductor manufacturing process, ensuring precise application of photoresist and patterning. They contribute to high performance and reliability in microchip production.