High-Precision Deposition Systems for CVD & Epitaxy
Deposition systems for CVD and epitaxy are integral to producing thin films and advanced materials. They ensure precise control over film thickness and composition, enhancing product quality.
No products found in this category.
Common Applications
Semiconductor fabrication
LED manufacturing
Solar cell production
Optoelectronics
Microelectromechanical systems (MEMS)
Advanced material research
Frequently Asked Questions
What are deposition systems used for?
Deposition systems, including CVD and epitaxy, are used to create thin films and layered structures essential for semiconductor devices and advanced materials. These systems enable precise control over deposition parameters to achieve desired film characteristics.
How does chemical vapor deposition work?
Chemical vapor deposition (CVD) works by introducing volatile precursors in a vapor phase that react on the substrate surface to form a thin film. This process is widely used for coating semiconductor wafers.
What is the difference between CVD and epitaxy?
While both involve deposition, CVD is a general process for creating thin films from gaseous reactants, whereas epitaxy specifically refers to the deposition of a crystalline layer that follows the orientation of the substrate crystal.
What are common applications of epitaxy?
Epitaxy is commonly used in the manufacturing of semiconductor devices, such as transistors, LEDs, and photovoltaic cells, where precise crystalline structure is crucial for performance.