Other Chemical Vapor Deposition Equipment

List other sub-categories under Chemical Vapor Deposition Equipment

Show other product types under Chemical Vapor Deposition Equipment

	Item ID	Item Description		Description	Cass to Cass	#		Price	Notes	Location
		Make	Model
								$
	197026	Applied Materials	Centura EPI	2 Epi Chambers & 1 SiCoNi Chamber		1				East Fishkill, New York
	198214	Applied Materials	Centura WxZ	CVD W Plug Deposition		1				Singapore,
	198657	Applied Materials	P5000	Passivation system.		1				Singapore,
	195174	ASM	E3200	Epsilon 3200, Epitaxial Reactor		1				Dresden, Saxony
	199194	ASM	E3200	300mm Reduced Pressure EPI deposition system		1			N*	Dresden, Saxony
	199195	ASM	E3200	300mm EPI deposition system		1			N*	Dresden, Saxony
	195647	ASM	Epsilon 3200	Epi Deposition System		1				Dresden, Saxony
	198242	Novellus Systems	C3 SPEED MAX	High Density Plasma CVD		1				Malta, New York
	191492	Picosun	Sunale R-200	Advanced ALD Reactor		1			F*	East Fishkill, New York
	178249	Tel	Trias	Manufactured in 2005; Status: Bagged and Skidded		1				Taichung, Taichung City
	178252	Tel	Trias	Manufactured in 2010; Status: Crated	YES	1				Taichung, Taichung City
	199090	Tokyo Electron Ltd	Trias CVD	Multi-Chamber TiN Deposition system		1			N*	Taichung, Taichung City
	199092	Tokyo Electron Ltd	Trias CVD	Multi-Chamber TiN Deposition system		1			N*	Taichung, Taichung City

NOTE:
   photo available
   reference document attached
  F* if the item is specially featured
  N* if the item is newly added, and/or
  R* if the item's price is recently reduced.