 |
Item ID |
Photo |
Short Description |
Product Type / Details |
#
|
Price |
Notes |
Location |
| Make |
Model |
| |
|
$ |
|
 |
195174
|
ASM
|
ASM |
E3200 |
in Chemical Vapor Deposition Equipment
|
1
|
|
|
 |
Dresden, Saxony |
|
ASM, E3200, 300mm, Epi Deposition System:ASM, E3200 Reduced Pressure, 300mm, Epi Deposition System Epsilon 3200, Epitaxial Reactor In the fab. • Gas Loops:
– Nitrogen (N2) purge
– Hydrogen (H2) carrier and purge
– Hydrogen chloride (HCl) wafer and chamber etch
– Primary silicon source, dichlorosilane (SiH2Cl2, gas)
– Low flow hydrogen chloride (HCl)
– Auxiliary silicon source, silane (SiH4)
– Germanium source, germane (GeH4)
• Advanced application valving (for multilayer sharp-transition processing)
|
|
195647
|
ASM
|
ASM |
Epsilon 3200 |
in Chemical Vapor Deposition Equipment
|
1
|
|
|
|
Dresden, Saxony |
|
ASM, E3200, 300mm, Epi Deposition System:ASM, E3200 Reduced Pressure, 300mm, Epi Deposition SystemEpsilon 3200, Epitaxial Reactor
In the fab.
• Gas Loops:
– Nitrogen (N2) purge
– Hydrogen (H2) carrier and purge
– Hydrogen chloride (HCl) wafer and chamber etch
– Primary silicon source, dichlorosilane (SiH2Cl2, gas)
– Low flow hydrogen chloride (HCl)
– Auxiliary silicon source, silane (SiH4)
– Germanium source, germane (GeH4)
• Advanced application valving (for multilayer sharp-transition processing)
|
|
199194
|
ASM
|
ASM |
E3200 |
in Chemical Vapor Deposition Equipment
|
1
|
|
|
N* |
Dresden, Saxony |
|
ASM, E3200, 300mm, Epi Deposition System:ASM, E3200, 300mm, Epi Deposition System
|
|
199195
|
ASM
|
ASM |
E3200 |
in Chemical Vapor Deposition Equipment
|
1
|
|
|
N* |
Dresden, Saxony |
|
ASM, E3200, 300mm, Epi Deposition System:ASM, E3200, 300mm, Epi Deposition System
|
|
198212
|
ASML
|
ASML |
PAS5500 /100D |
in Wafer Steppers
|
1
|
|
|
F* |
Singapore, |
|
ASML PAS 5500 - /100D, iLine Stepper, 200mm:ASML PAS 5500 - /100D, iLine Stepper, 200mm Bagged & Skidded in Warehouse
|
|
180601
|
ASML
|
ASML |
/300 |
in Wafer Steppers
|
1
|
|
|
F* |
Temecula, California |
|
ASML /300 DUV Stepper - 6":ASML /300 - DUV Wafer Stepper - 6" Wafer Refurbished condition, Lens data taken before decommissioning shows good lens quality. Currently decomissioned, not available for testing. Lens under N2 Purge, unit stored in cleanroom.
|
|
197965
|
ASM
|
ASM |
Epsilon 3200 |
in Epitaxial Reactors
|
1
|
|
|
F*N* |
Villach, Carinthia |
|
EPI ASM:ASM EPI Epsilon 3200
|
|
197858
|
ASML
|
ASML |
TWINSCAN XT:850F |
in Optical Inspection Equipment
|
1
|
|
|
|
Veldhoven, North Brabant |
|
ASML, XT: 850F, 300mm, KrF, :ASML, TWINSCAN XT:850F, 300mm, KrF, S/N: m7691 Laser model CYMER ELS-7610K (40W)
MES machine type XT850F
OIU/Reticle-/Waf.aux.port Right Configuration
Power 400 Volt
In warehouse stored.
|
|
196827
|
ASML
|
ASML |
AT 850 |
in Optical Inspection Equipment
|
1
|
|
|
|
East Fishkill, New York |
|
ASML AT-850, 300mm, KrF 248nm Scanner: ASML AT-850D, 300mm, KrF 248nm Scanner, S/N : m5946 Known Tool Issues:
Currently power off with Lens gas flowing, tool had issue with illumination rack that will require replacement. The tool currently has all of the parts present, but they have not necessarily been calibrated or setup with the tool being off. Laser has 104.5 Billion pulses on it. Components were good when shutdown.
The Beam steering hardware in not functional, and the ACC needs an heat exchanger installed Tool ID: GB03
|
|
196930
|
ASM
|
ASM |
A300 VT |
in LPCVD Furnaces
|
1
|
|
|
F* |
Burlington, Vermont |
|
ASM Advance 300 VT, Vertical Furnace, 200mm, Oxidation:ASM Advance 300 VT, Vertical Furnace, 200mm, Oxidation Cold shutdown Vintage 1997 S/N: 71F5669AE
|
|
196931
|
ASM
|
ASM |
A300 VT |
in LPCVD Furnaces
|
1
|
|
|
F* |
Burlington, Vermont |
|
ASM Advance 300 VT, Vertical Furnace, 200mm, Oxidation:ASM Advance 300 VT, Vertical Furnace, 200mm, Oxidation S/N: 71F5669AC
|
|
196932
|
ASM
|
ASM |
A300 VT |
in LPCVD Furnaces
|
1
|
|
|
F* |
Burlington, Vermont |
|
ASM Advance 300 VT, Vertical Furnace, 200mm, Oxidation:ASM Advance 300 VT, Vertical Furnace, 200mm, Oxidation Cold, Shutdown S/N: 71F5669AE
|
|
183169
|
ASM
|
ASM |
A412 |
in LPCVD Furnaces
|
1
|
|
|
F* |
Malta, NY |
|
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN:ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN Twin LPCVD SiN Reactors TOOL ID: FVX2541 2011 Vintage
|
|
183170
|
ASM
|
ASM |
A412 |
in LPCVD Furnaces
|
1
|
|
|
F* |
Malta, New York |
|
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN:ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN
Twin LPCVD SiN Reactors
TOOL ID: FVX2540
2011 Vintage Tool ID: FVX2541
|
|
183417
|
ASM
|
ASM |
A412 Dual Reactor |
in LPCVD Furnaces
|
1
|
|
|
F* |
Malta, New York |
|
ASM A412 Vertical Furnace, 300mm, LPCVD As Dpoed Poly / TiN:ASM A412 Vertical Furnace, 300mm, LPCVD As Dpoed Poly / TiN Twin LPCVD As Doped Reactors TOOL ID: FVX2560 Chemistry TiCl4, NH3, NF3, Cl2, SiH4, AsH4 2011 Vintage Tool ID: FVX2560
|
|
183418
|
ASM
|
ASM |
A412 Dual Reactor |
in LPCVD Furnaces
|
1
|
|
|
F* |
Malta, New York |
|
ASM A412 Vertical Furnace, 300mm, LPCVD As Doped Poly / TiN:ASM A412 Vertical Furnace, 300mm, LPCVD As Doped Poly / TiN Twin LPCVD As Doped Reactors TOOL ID: FVX2561 Chemistry TiCl4, NH3, NF3, Cl2, SiH4, AsH4 2011 Vintage Tool ID: FVX2561
|
|
|
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