REYNOLDSTECH PHOTORESIST DEVELOP HOOD
Photoresist Develop Station with Headway Wafer Spin Cleaner
Gas and chemical storage systems are essential for securely storing volatile substances. They ensure safety and compliance in industrial settings.
Photoresist Develop Station with Headway Wafer Spin Cleaner
Semi-Automated Acid Wet Bench System
Solvent Bench Rear Exhaust with Fire Suppression System by Mark Systems
Used Configuration:
Tank 1: EKC
Tank 2: P1331
Tank 3 and 4: DMF
Tank 5: IPA
Known errors:
Filter from tank 4 is leaking
Heater 1 from tank 4 is broken
Heater 3 from tank 4 is broken
Toolcontroller with Windows XP
Remote controller
Ready for endpointdetection system
Process: Copper / Titan-Wolfram / dHF (dilluted HF)
div. spareparts possible (negotiable)
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