REYNOLDSTECH PHOTORESIST DEVELOP HOOD
Photoresist Develop Station with Headway Wafer Spin Cleaner
Acid wet stations are specialized units used for safe and controlled chemical etching and cleaning processes. They ensure precision and safety in surface treatment applications.
Photoresist Develop Station with Headway Wafer Spin Cleaner
Semi-Automated Acid Wet Bench System
Toolcontroller with Windows XP
Remote controller
Ready for endpointdetection system
Process: Copper / Titan-Wolfram / dHF (dilluted HF)
div. spareparts possible (negotiable)
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