 |
Item ID |
Photo |
Short Description |
Product Type / Details |
#
|
Price |
Notes |
Location |
Make |
Model |
|
|
$ |
|
 |
257348
|
AMAT
|
AMAT |
DXZ/CXZ Chamber |
in Production Tools
3 DXZ/CXZ Chambers for Centura/P5000:3 DXZ/CXZ Chambers for Centura/P5000 Mainframe is transport rack
|
1
|
|
|
N* |
Villach, Kärnten |
|
 |
253232
|
AMAT
|
AMAT |
CENTURA ENABLER |
in Chemical Vapor Deposition Equipment
AMAT CENTURA ENABLER, 300mm, s/n: 407472:Dry Etch, Bx-, Cx-, E1 layers, 300mm wafers, 32nm BD/SICOH Etch
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
239336
|
AMAT
|
AMAT |
Centura EPI 8 inch |
in Epitaxial Reactors
AMAT Centura EPI 8 Zoll:The system was completely overhauled by us with external service AMAT on site at that time!; Blower controls upgraded every 3 chambers; Approximately 4 years ago the Complete Gas Cabinet was upgraded from Legaty to Universal Gas Cabinet on site with the FA. AMAT upgraded costs €0.5 million; The facility has proprietary Modorized Lift 3x;
|
1
|
|
|
 |
Regensburg, Bavaria |
|
 |
256746
|
AMAT
|
AMAT |
HDP Centura |
in Production Tools
AMAT Centura HDP:Software: Win 10 OR 4000 WTM Controller 3x ENI Generator Racks Chiller INR-498-011D 2x Remote Monitor High Density Plasma Process Process Chambers: A,B,C Orienter chamber F
|
1
|
|
|
N* |
Regensburg, Bavaria |
|
 |
252521
|
AMAT
|
AMAT |
CENTURA |
in Chemical Vapor Deposition Equipment
AMAT CENTURA, 200mm, s/n: 9895:APPLIED MATERIALS DPS POLY ETCHER
|
1
|
|
|
 |
Singapore |
|
 |
255097
|
AMAT
|
AMAT |
CENTURA |
in Chemical Vapor Deposition Equipment
AMAT CENTURA, 300mm, s/n: 332448:HDPCVD
|
1
|
|
|
|
Singapore |
|
 |
252613
|
AMAT
|
AMAT |
Centura |
in Chemical Vapor Deposition Equipment
|
1
|
|
|
 |
East Fishkill, New York |
|
 |
253231
|
AMAT
|
AMAT |
Centura |
in Chemical Vapor Deposition Equipment
AMAT Centura, 300mm, s/n: 420809:Centura ACP300mm EPI, RP System
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
252341
|
AMAT
|
AMAT |
Olympia SiN LowK |
in Chemical Vapor Deposition Equipment
|
1
|
|
|
 |
Malta, New York |
|
 |
251069
|
Applied Materials
|
Applied Materials |
P5000 |
in Chemical Vapor Deposition Equipment
|
1
|
|
|
 |
Singapore |
|
 |
254172
|
AMAT
|
AMAT |
P5000 MARK II |
in Chemical Vapor Deposition Equipment
|
1
|
|
|
 |
Singapore |
|
 |
254112
|
AMAT
|
AMAT |
Precision 5000 |
in Chemical Vapor Deposition Equipment
|
1
|
|
|
 |
Burlington, Vermont |
|
 |
257168
|
AMAT
|
AMAT |
PRODUCER SE |
in Chemical Vapor Deposition Equipment
|
1
|
|
|
N* |
Dresden, Saxony |
|
 |
257169
|
AMAT
|
AMAT |
PRODUCER SE |
in Chemical Vapor Deposition Equipment
|
1
|
|
|
N* |
Dresden, Saxony |
|
 |
255098
|
AMAT
|
AMAT |
PRODUCER SE |
in Chemical Vapor Deposition Equipment
|
1
|
|
|
|
Dresden, Saxony |
|
 |
257167
|
AMAT
|
AMAT |
PRODUCER SE |
in Chemical Vapor Deposition Equipment
|
1
|
|
|
N* |
Dresden, Saxony |
|
 |
251303
|
AMAT
|
AMAT |
PRODUCER SE |
in Chemical Vapor Deposition Equipment
|
1
|
|
|
 |
Singapore |
|
 |
257176
|
AMAT
|
AMAT |
EPI Centura ACP |
in Epitaxial Reactors
EPI Centura ACP 300mm "Yu Shan":Brand new and unused EPI Centura ACP 300 mm 4 Chambers; Chamber code RH3, Lamp type BNA8 R3 Mainframe Configuration E4 Single, 4 Facet SC ENP BLK2, Loadport AMAT Standard 300mm, EPI Water Module LT Design. Tool out of Project: "Yu Shan" The original rough IFX Equipment procurement value was 10,3 M€ Will be now sold for an attractive price. Equipment is... ...brand new ...never used ...original packaged and crated ...located in Asia ...complete and fully functional ...professional stored in Warehouse
|
1
|
|
|
N* |
Regensburg, Bavaria |
|
 |
252342
|
Hitachi Kokusai Elec
|
Hitachi Kokusai Elec |
Quixace - DJ-1236VN-DF |
in LPCVD Furnaces
|
1
|
|
|
 |
Malta, New York |
|
 |
254361
|
Hitachi Kokusai Elec
|
Hitachi Kokusai Elec |
Quixace - DJ-1236VN-DF |
in LPCVD Furnaces
|
1
|
|
|
 |
Malta, New York |
|
 |
254105
|
Hitachi High-Technol
|
Hitachi High-Technol |
M8000 - M8190XT |
in Chemical Vapor Deposition Equipment
HITACHI M8000 - M8190XT, 300mm, s/n: 12DN20301:ETC_SpacerEtch
|
1
|
|
|
 |
Malta, New York |
|
 |
254251
|
Jusung Engineering L
|
Jusung Engineering L |
Eureka 2000 |
in Chemical Vapor Deposition Equipment
|
1
|
|
|
 |
Burlington, Vermont |
|
 |
253032
|
LAM Research Corp.
|
LAM Research Corp. |
9600 BRME |
in Chemical Vapor Deposition Equipment
|
1
|
|
|
 |
Burlington, Vermont |
|
 |
252619
|
LAM Research Corp.
|
LAM Research Corp. |
C3-SPEED |
in Chemical Vapor Deposition Equipment
LAM C3-SPEED, 300mm, s/n: 03-9-C30214:300MM WTS with 2 HDP STI oxide chambers
|
1
|
|
|
 |
East Fishkill, New York |
|
 |
254139
|
LAM Research Corp.
|
LAM Research Corp. |
Novellus Speed |
in Chemical Vapor Deposition Equipment
|
1
|
|
|
 |
Singapore |
|
 |
254146
|
LAM Research Corp.
|
LAM Research Corp. |
Novellus Speed |
in Chemical Vapor Deposition Equipment
|
1
|
|
|
 |
Singapore |
|
 |
253233
|
Tokyo Electron Ltd
|
Tokyo Electron Ltd |
Tactras Vigus |
in Chemical Vapor Deposition Equipment
TEL Tactras Vigus, s/n: NA:TEL Tactras Vigus LK3
|
1
|
|
|
|
Dresden, Saxony |
|
 |
249038
|
Tel
|
Tel |
Indy IRAD |
in LPCVD Furnaces
TEL, Indy IRAD, 300mm, s/n: R00000895110, TEL Furnace:TEL, Indy IRAD, 300mm, s/n: R00000895110, TEL Furnace
|
1
|
|
|
 |
East Fishkill, New York |
|
 |
249039
|
Tel
|
Tel |
Indy IRAD |
in LPCVD Furnaces
TEL, Indy IRAD, 300mm, s/n: R00001065058, TEL NIT HIK FURNACE:TEL, Indy IRAD, 300mm, s/n: R00001065058, TEL NIT HIK FURNACE
|
1
|
|
|
 |
East Fishkill, New York |
|
|
 |