Contact/Proximity Mask Aligners

Contact and proximity mask aligners are essential tools for photolithography, facilitating precise pattern transfers onto semiconductor wafers. They support high-resolution imaging and consistent production outcomes in semiconductor manufacturing.

  1. KARL SUSS MANUAL MASK ALIGNER 150 MM

    Mask Aligners: Contact/Proximity

    KARL SUSS MANUAL MASK ALIGNER 150 MM

    Manual Mask Aligner The Karl Suss MA 150M Manual Mask Aligner is a mask alignment and exposure system which offers unsurpassed precision and versatility when handling wafers up to 150 mm in diameter.

Popular Manufacturers

Quintel Tamarack Scientific Karl Suss

Common Applications

wafer patterning

microfabrication

semiconductor device manufacturing

MEMS production

photonic device fabrication

thin film processes

Buying Guide

Contact/Proximity Mask Aligners Buying Considerations

  • Assess resolution requirements and ensure the aligner's capability matches your production needs.
  • Determine whether manual, semi-automatic, or fully automatic operation best suits your workflow.
  • Verify compatibility with existing photolithography setups and wafer sizes.
  • Consider the alignment system's precision and repeatability for consistent outcomes.
  • Evaluate brand reputation and availability of technical support and service options.

Frequently Asked Questions

What is a contact mask aligner?
A contact mask aligner is a device used to place a photomask in direct contact with a wafer for pattern transfer in photolithography.
How does a proximity mask aligner work?
A proximity mask aligner uses a small gap between the photomask and the wafer during the pattern transfer process, minimizing contact-related defects.
What industries use contact/proximity mask aligners?
These aligners are predominantly used in the semiconductor industry for manufacturing microelectronic devices.
What are the benefits of using contact mask aligners?
They offer high resolution and precise overlay accuracy in photolithography processes.