Excimer VUV/03 Cleaning Unit UV Cleaning Applications:

• Enhancement of wetability and adhesion of photoresist
• Enhancement of wetability of SOG
• Cleaning before deposition process
• Soft ashing
• High-speed removal of static electricity
• Cleaning of reticles Features:
• Simple dry cleaning allows removal of most of organic matter
• No charging damage
• Instantaneous on/off operation suited to single-wafer process
• Low-temperature process
• Cleaning process can be performed under atmospheric air