IMTEC ACCUBATH CONSTANT TEMPERATURE QUARTZ BATH
Constant Temperature Bath
Cleaning & Surface Prep
Cleaning & Surface Prep are essential equipment in semiconductor process equipment applications. They provide reliable performance for industrial operations.
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SEMITOOL SPIN RINSE DRYER UP TO 125MM
Spin Rinse Dryer up to 125mm
Built in Resistivity Monitor
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SEMITOOL SPIN RINSE DRYER DUAL STACK UP TO 125MM
Spin Rinse Dryer up to 125mm
Built in Resistivity Monitor
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MICROAUTOMATION 2066 Mask/Substrate Cleaner - For Parts Only
Mask/Substrate Cleaner - For Parts Only
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VERTEQ IPA VAPOR DRYER 200 MM
IPA Vapor Dryer
IPA 2800 is a drying system using isopropyl alcohol to provide a clean,dry surface on wafers and substrates System features a class 10 elevator,ultra-pure nitrogen loading environment, short load-to-vapor time and fast recovery between cycles The system is partical netural at 0.2 microns
This system is NOT a marangoni style
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SEMITOOL SPRAY SOLVENT TOOL
Spray Solvent Tool Refurbished by Rhetech in 2000
Photoresist develop/strip, polymer removal, pre-metal deposition cleaning. High speed rinse and dry of wafers, with low particle counts and reduced DI water consumption.
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Miele PG8536
The tool is working, in good condition and located in clean room
no missing parts
Glass clean
Popular Manufacturers
Common Applications
Semiconductor Process Equipment applications
Industrial use
Process equipment
Frequently Asked Questions
What are Cleaning & Surface Prep used for?
Cleaning & Surface Prep are used in semiconductor process equipment applications.
Do listings include specifications?
Yes, most sellers provide detailed specifications.
What should I check before purchasing?
Review condition, specifications, and documentation.
Are these compatible with existing systems?
Check specifications for compatibility.
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