Coating & Lithography Systems
Coating & Lithography Systems are essential equipment in semiconductor process equipment applications. They provide reliable performance for industrial operations.
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HEADWAY RESEARCH MANUAL PHOTORESIST SPIN COATER
Manual Photoresist Spin Coater
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BLE RESPECT AUTOMATIC PHOTORESIST COATER
Automatic Photoresist Coater System is designed exclusively to coat and bake substrates using spinning and heating techniques.
BLE was acquired by Suss Microtec
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BLE RESPECT AUTOMATIC PHOTORESIST DEVELOPER
System is designed exclusively to develop and bake substrates using spinning and heating techniques
BLE was acquired by Suss Microtec
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CAMALOT/SPEEDLINE DISPENSING SYSTEM
Dispensing System Camalot/Speedline model 1818
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SEALANT EQUIPMENT & ENGINEERING DISPENSE SYSTEM
Positive Displacement Dispense System
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ASML-AT1250 DUV193nm
Equipment according the age in good in good shape,
however only one wafer stage is currently working
2003: "ASML's new generation TWINSCAN system patterns for 65 nm node"
Equipment inspection virtual or physical possible
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TEL ACT8-D -Track
ACT DB System, AC Power Box, T/C Unit 1+2, T/H Controller ESA 1+2, Chemical Cabinet 1, 2, 3
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GRACO THERMO-O-FLOW 20 HOT MELT BULK SYSTEM 20 LITER
New Surplus -- Never Installed
Primary and Secondary Configuration for Constant Flow Applications.
Photos listed are of 1 system
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Common Applications
Semiconductor Process Equipment applications
Industrial use
Process equipment
Frequently Asked Questions
What are Coating & Lithography Systems used for?
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What should I check before purchasing?
Are these compatible with existing systems?
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