Other Etchers
Other etchers are specialized equipment used to precisely remove material during semiconductor manufacturing. They enable high-performance etching to ensure accurate and reliable device production.
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PLASMATHERM RIE PECVD MOUNTED IN GLOVEBOX
Reactive Ion Etch / PECVD system mounted in glovebox with an intregrated air purfier O2 and H20 sensors on board. Both top and bottom electrodes can be powered sequentially.
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Plasma-Therm 790 Reactive Ion Etcher - Remaufactured with ECT Upgrade
PLASMA-THERM 790 Reactive Ion Etcher; Serial Number PTI-78272F
- Manually Loaded Process Chamber with 8” (dia.) Cathode
- Gas Distribution Panel with 4ea Gas Channels
- MKS 1479 Metal Sealed Mass Flow Controllers
- 4ea Additional Gas Channels Available
- RFPP RF5S RF Generator: 500W @ 13.56MHz
- RFPP AMN-5 Auto Matching Network
- RFPP AMNPS-2A Auto Matching Network Controller
- Leybold TMP 361 Turbomolecular Pump
- Leybold NT 150/360 Turbomolecular Pump Controller
- EquipmentWorks 2.6 Application SW
- Industrial PC Running UBUNTU LINUX OS, Intel I7 CPU at 3.4 GHz,16Gb RAM & 500GB SSD
- All Analog & Digital I/O Modules Controlled by BECKHOFF Ethernet I/O Via Modbus TCP/IP Communications Protocol.
- All I/O Modules Available from BECKHOFF Automation and are Plug & Play Compatible
- All Pneumatic Valves Controlled by SMC Modules Via Modbus TCP/IP Communications Protocol
- All SMC Pneumatic Valves Available from SMC USA
- Standard 21” Flat Panel Monitor, Keyboard & Mouse
- Edwards QDP40 Dry Roughing Pump
- NESLAB HX-75 Chiller
- Electrical Disconnect Box - 208V, 60Hz, 3 Ph
- System Fully Refurbished & Ready for Demonstration
- Guaranteed to Meet or Exceed OEM Specifications
- Price……$ 80,000.00 USD
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PLASMA-THERM SLR 770 ICP Plasma Etcher
PLASMA-THERM SLR 770 Inductively Coupled Plasma Etcher
- Single Process Chamber with SLR (Shuttle Lock Transfer) Load Lock
- Manual Load with Load Lock Handling Currently Configured for 4” Wafers
- Ceramic Wafer Clamp with Helium Backside Cooling System
- Gas Distribution Box with 5ea Gas Channels
- ENI ACG-6 RF Generator: 600W @ 13.56MHz
- ENI Automatic Matching Network
- RFPP RF20M RF Generator: 2000W @ 2.0MHz
- RFPP Automatic Matching Network
- Six Zone Chamber Heater with Temperature Controller
- LEYBOLD 900 Turbo Pump with Mag 1000 Controller
- MKS ITR Ion Gauge Controller
- VAT Gate Valve with PM-5 Controller
- Mechanical Roughing Pump
- NESLAB HX-75 Chiller
- Electrical Disconnect Box - 208V, 60Hz, 3 phase
Popular Manufacturers
Common Applications
semiconductor wafer fabrication
integrated circuit production
MEMS device manufacturing
printed circuit board fabrication
solar cell processing
advanced sensor development
Frequently Asked Questions
What are other etchers used for?
They are used for the precise removal of material in semiconductor manufacturing to create intricate patterns.
How do plasma etchers differ from laser etchers?
Plasma etchers use ionized gas to remove material, while laser etchers use focused light beams for precision etching.
What industries use semiconductor etchers?
Primarily used in semiconductor manufacturing, they are also utilized in electronics and advanced materials industries.
What are the benefits of using corporate surplus etchers?
Corporate surplus etchers offer cost savings while maintaining high performance and reliability for manufacturing processes.
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