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Other Wafer Production Equipment


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Item IDItem DescriptionDescriptionSize RangeCass to Cass#PriceNotes Location
MakeModelSet Size
$
192482 Applied Komatsu Tech 1600PVD Al, Cu, Ti 1 F* Malta, New York
199193 Applied Materials Reflexion300mm CMP 1 East Fishkill, New York
200772 Applied Materials Reflexion300mm STI CMP 1 East Fishkill, New York
200773 Applied Materials Reflexion 1 East Fishkill, New York
200774 Applied Materials Reflexion300mm STI CMP 1 East Fishkill, New York
204848 ASML NXT:1950AArF Immersion Scanner 1 East Fishkill, New York
197858 ASML TWINSCAN XT:850F300mm KrF Scanner 1 Veldhoven, North Brabant
204897 ASML XT:1250300mm ArF Lithography 1 Dresden, Saxony
204384 ASML XT:1250DArF Scanner 1 Dresden, Saxony
207901 ASML XT:1400EArF Twinscan 1 Singapore
198239 AXIDEN APR 4300 Pod RegeneratorFOUP Cleaner. Yield Enhancement 1 Malta, New York
205373 AXIDEN APR4300300mm Pod Regenerator 1 F* Malta, New York
204936 Brooks M100Pod Cleaner 1 Malta, New York
204937 Brooks M1900Reticle Stocker 1 Malta, New York
199378 Canon Anelva C-7100GTMulti-Chamber Sputtering System 1 East Fishkill, New York
207936 Carl Zeiss AIMS 32-193iPhtotomask Repair System 1 Burlington, Vermont
207931 Carl Zeiss MeRit HR32 PlusMask Repair System 1 Burlington, Vermont
178393 E-SUN Systems SEMI AUTO POD CLEANERManufactured in 2008; Status: Cold Shutdown 1 Singapore
203147 Eaton Compact IIH2 Anneal Furnace, twin tube 1 East Fishkill, New York
204497 Ebara F-REX300S 1 Singapore
204508 Ebara FREX 300 S 1 Singapore
201472 Ebara FREX 300 S300mm CMP - Ox 1 Singapore
201475 Ebara FREX 300 SCMP Oxide 1 Singapore
203517 Ebara FREX 300 S2Tungsten CMP 1 Malta, New York
201462 Ebara FREX 300 S2300mm Oxide CMP system 1 Singapore
201473 Ebara, F-REX300S, 300mm, CMP, Chemical Mechanical Polish 1 Singapore
207930 Etec Systems MEBES 5000Mask Lithography System 1 Burlington, Vermont
190267 Fisher Sci FD400Binder Oven 1 Singapore
204933 Lasertech BI 100Reticle Backside Inspection and Particle Height... 1 Malta, New York
190998 Lesker Aluminum EvaporatorCustom Deposition System 1 Burlington, Vermont
207933 Matsushita Seiki M515Photomask Pellicle Automounter 1 Burlington, Vermont
207932 Matsushita Seiki M777Pellicle Demounter 1 Burlington, Vermont
202453 Nitto Denko Nitto MSA840Nitto MSA840 Mounting Machine 1 59,488.24 Regensburg, Bavaria
181814 Nitto Denko HMT840Manual Defoiler tool200 mm 1 Singapore
202820 Novellus Systems Inova300mm PVD Sputter Dep 1 Malta, New York
205258 Novellus Systems Inova NEXT300mm PVD, Aluminum 1 Singapore
202896 Novellus Systems Inova NEXT300mm Sputter Dep system 1 Singapore
189685 Novellus Systems Inova PVDPVD Cu Barrier-Seed system200 mm 1 Singapore
190262 Novellus Systems Inova PVDPVD Cu Barrier-Seed system 1 Singapore
195988 Novellus Systems Inova PVD300mm PVD Cu 1 Singapore
204909 Novellus Systems Inova xT300mm PVD, Aluminum 1 Singapore
189136 Novellus, Inova, PVD, 200mm, Sputter Dep, Cu Seed 1 Singapore
206003 NuFlare Technology I EBM-9500Photomask Writer 1 Burlington, Vermont
204935 Rorze RSR160Reticle Handler 1 Malta, New York
205978 Sigmameltec SFB6500Photomask Post Expose Bake System 1 Burlington, Vermont
202840 Ulvac CERAUS Zi 1000Multi-Chamber Sputtering System 1 Singapore
202841 Ulvac CERAUS Zi 1000 1 Singapore

NOTE:
   photo available
   reference document attached
  F* if the item is specially featured
  N* if the item is newly added, and/or
  R* if the item's price is recently reduced.

Items from the following manufacturers are offered under Other Wafer Production Equipment:
Applied Komatsu Technology, Applied Materials, Inc., ASML, AXIDEN, Brooks, Canon Anelva, Carl Zeiss, E-SUN Systems, Eaton, Ebara, Etec Systems, Fisher Scientific, Lasertech, Lesker, Matsushita Seiki, Nitto Denko, Novellus Systems, NuFlare Technology I, Rorze, Sigmameltec, Ulvac