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 Offered (box) or Wanted (coins)  Item ID  Photo Short Description Product Type / Details # Price Notes Location
Make Model
  $  
187746
Applied Materials  

Applied Materials  

AMAT Enabler chamber 

List all items of this typeCluster Plasma Tools - Oxide

in Cluster Plasma Tools

2   F* Dresden, Saxony
2x AMAT Enabler chamber:

ETC380-02-B und ETC380-05-D
AMAT Enabler chamber manufactured 12/2002 und 03/2007

195982
Accent Optical  

Accent Optical  

Caliper Elan 

List all items of this typeLithography Equipment - Other

in Lithography Equipment

1   Dresden, Saxony
Accent Optical, CALIPER ELAN, 300mm, Overlay Measurement:
Accent Optical, CALIPER ELAN, 300mm, Overlay Measurement




!!!MULTIPLE UNITS AVAILABLE.  PLEASE INQUIRE!!!
187744
Applied Materials  

Applied Materials  

AMAT Axiom strip chamber  

List all items of this typeCluster Plasma Tools - Oxide

in Cluster Plasma Tools

1   F* Dresden, Saxony
AMAT Axiom strip chamber :
AMAT Axiom strip chamber
187742
Applied Materials  

Applied Materials  

AMAT Centura Rev.4 for 12 " 

List all items of this typeCluster Plasma Tools - Silicon

in Cluster Plasma Tools

1   F* Regensburg, BY
AMAT Centura Rev.4:
AMAT Centura Rev.4
Serial Number: 40 99 39 


AMAT Centura Rev.4 
Serial Number: 40 99 39 
Equipment Code: ETC320-05
AMAT Centura Rev.4;
300mm AMAT Centura Rev.4;
with 2 Load Locks and 2 Load Ports
187743
Applied Materials  

Applied Materials  

AMAT eMax CT chamber  

List all items of this typeCluster Plasma Tools - Oxide

in Cluster Plasma Tools

1   F* Dresden, Saxony
AMAT eMax CT chamber :
AMAT eMax CT chamber
187745
Applied Materials  

Applied Materials  

AMAT eMax CT plus chamber 

List all items of this typeCluster Plasma Tools - Oxide

in Cluster Plasma Tools

1   F* Dresden, Saxony
AMAT eMax CT plus chamber:
AMAT eMax CT plus chamber manufactured 12/2002
187747
Applied Materials  

Applied Materials  

AMAT eMax CT plus chamber 

List all items of this typeCluster Plasma Tools - Oxide

in Cluster Plasma Tools

1   F* Dresden, Saxony
AMAT eMax CT plus chamber:
AMAT eMax CT plus chamber manufactured 12/2002
197026
Applied Materials  

Applied Materials  

Centura EPI 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   East Fishkill, New York
AMAT, Centura EPI, 300mm, Epi Deposition System:
AMAT, Centura EPI, 300mm, Epi Deposition System

Two - Epi Deposition Chambers.
One - SiCoNi Chamber,

In the Fab, Cold.

S/N 411383
192485
Amerimade Tech  

Amerimade Tech  

10 FT FAS-ENIG WET PROCESS STATION 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Malta, New York
Amerimade, 10 FT FAS-ENIG WET PROCESS STATION, 300mm:
Amerimade, 10 FT FAS-ENIG WET PROCESS STATION, 300mm

Electroless Nickel Immersion Gold (ENIG) Processing Station

2016

Eagle™ M8 Wet Processing System
Wet Process Station, Manual, Front Access, FM4910, 12 Ft
Control System, PC/PLC Based, No Multi-Tasking
Al Clean - Recirculating/Filtered Bath, NPP, w/ Drain Heat Compatible
  Thermal Circulator, Remote, Air-Cooled, 1.5kW Heating, 0.82kW Cooling
Zincation - Static Bath, Natural Polypropylene, w/ Drain
Acid Clean - Recirculating/Filtered Bath, NPP, w/ Drain Heat Compatible
  Thermal Circulator, Remote, Air-Cooled, 1.5kW Heating, 0.82kW Cooling
E-Less Ni - Heated Recirculating/Filtered, PVDF, w/ Drain
Immersion Gold - Heated Recirculating/Filtered, PVDF, w/ Drain
(3) Quick Dump Dump Rinse Bath, Polypropylene, Dual Dump Door



192483
Amerimade Tech  

Amerimade Tech  

12 FT RAS-PVCC CU ECD SYSTEM 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Malta, New York
Amerimade, 12 FT RAS-PVCC CU ECD SYSTEM, Copper Plating Tool, 300mm:
Amerimade, 12 FT RAS-PVCC CU ECD SYSTEM, Copper Plating Tool, 300mm

Copper (Cu) ElectroChemical Deposition (ECD) Plating System

2016 Vintage
199767
Applied Materials  

Applied Materials  

Producer-eXT 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   F* Singapore
Applied Materials Producer-eXT, ETCH, 300mm, :
Applied Materials Producer-eXT, ETCH, 300mm, 

S/N: 414698
182414
Applied Materials  

Applied Materials  

Centura Enabler - Etch 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Dresden, Saxony
Applied Materials, AMAT, Enabler, Centura, 300mm Etch:

Applied Materials, AMAT, Enabler, Centura, 300mm Etch,

STATUS:  Cold Idle, Cleaned

Dry Etch Applidations: MA, MB, KA, LT, 300mm wafers, 32nm TEOS Etch    

Gases: C4F6, CO,CH2F2,H2,N2,O2, Ar, CF4,CHF3, CO2, NH3


MUL

 

Tool ID: ETX659

 
182387
Applied Materials  

Applied Materials  

Enabler, Centura, 4 Chamber Etch 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Dresden, Saxony
Applied Materials, AMAT, Enabler, Centura, 300mm Etch, :
Applied Materials, AMAT, Enabler, Centura, 300mm Etch,

Dry Etch, Bx-, Cx-, E1 layers, 300mm wafers, 32nm BD/SICOH Etch  

MULTIPLE UNITS AVAILABLE:  Please inquire.
199734
Applied Materials  

Applied Materials  

Centura DCVD 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   F* Singapore
Applied Materials, Centura DCVD, 200mm, DARC, 3 Chambers:
Applied Materials, Centura DCVD, 200mm, DARC, 3 Chambers

Bagged  & Skidded in Warehouse

S/N: CA85
193144
Applied Materials  

Applied Materials  

Centura Etch 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Dresden, Saxony
Applied Materials, Centura Etch, 300mm, :
Applied Materials, Centura Etch, 300mm, 

Centura AP Platform

Chambers : 2 x Minos, 1 x Carina, 1 x Axion

S/N : 423383


199313
Applied Materials  

Applied Materials  

Centura Etch, DPS Minos 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   East Fishkill, New York
Applied Materials, Centura Etch, DPS Minos, 300mm:
Applied Materials, Centura Etch, DPS Minos,  300mm
178356
AMAT  

AMAT  

Centura AP, AdvantEdge G5  

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Dresden, SN
Applied Materials, Etch, AdvantEdge G5, Centura AP, 300mm W Bitline Etch:
Applied Materials, Etch, AdvantEdge G5 2 Chambers, Centura AP Platform,  300mm W Bitline Etch
Dry Etch; Bitline etch 40nm; PL-Etch 40nm; 300mm wafers   
Gases: BCl3, Cl2, CHF3, O2, N2, Ar, CF4, SF6, He, SiCl4, NF3

Tool ID  ETX260
178357
AMAT  

AMAT  

Centura 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   F* Malta, NY
Applied Materials, Etch, Centura Carina Chamber 300mm:
Tool ID : ETX2291-c

Chamber Only.
Carina Etch Chamber.
 Chamber Materials: ADVANCED CERAMIC
Lid Materials:  AG 1000
Process Ring: QUARTZ SINGLE RING
Plasma Exposed Chamber Oring: KALREZ
Cathode Temperature Range: 130 TO 250C
Carina Etch Swap Kit: 1
Chamber Viewport: STANDARD VIEWPORT
Endpoint Type: EyeD IEP
CCM Cover: NO



Location is Malta, NY.
199721
Applied Materials  

Applied Materials  

P5000 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Singapore
Applied Materials, P5000, Passivation 200mm:
Applied Materials, P5000, Passivation 200mm

Still in the FAB.

Available Q4 2018 .
199651
Applied Materials  

Applied Materials  

Producer III 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Singapore
Applied Materials, Producer CVD, 200mm:
Applied Materials, Producer CVD, 200mm
Producer III
Bagged & Skidded in Warehouse. 

S/N: 306133


199845
Applied Materials  

Applied Materials  

Producer SE 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Singapore
Applied Materials, Producer SE CVD, 300mm:

Applied Materials, Producer SE CVD, 300mm

2x BD II, 1x UV Cure

Bagged & Skidded in warehouse.

195981
Applied Materials  

Applied Materials  

Quantum XP 

List all items of this typeMedium Current Implanters

in Ion Implantation Equipment

1   Dresden, Saxony
Applied Materials, Quantum XP, High Current Ion Implanter, 300mm:
Applied Materials, Quantum XP,  High Current Ion Implanter, 300mm

!!!Multiple Units Available.  Please inquire !!!
199968
Semitool  

Semitool  

RAIDER sp312 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Santa Clara, California
Applied Materials, Semitool, Raider SP312, Bevel Edge Clean, 300mm:
Applied Materials, Semitool, Raider SP312, Bevel Edge Clean, 300mm

Cold Shutdown,  In the FAB.

Non Working Condition =>  WIP controller (PC) is faulty and upgrade required. Chamber of CP7, CP8 (PEC) are currently not functionally with alarm: spin amplifier failure. Filter housing and bracket for T1 (HF49%) are missing parts as parts are corroded and damaged.

S/N: T239001
199969
Applied Materials  

Applied Materials  

Centura UltimaX  

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Santa Clara, California
Applied Materials, UltimaX, HDP CVD, 300mm Oxide Deposition:

Applied Materials, UltimaX HDP CVD, 300mm Oxide Deposition

S/N: 409094

In Fab, Deinstalled.

183418
ASM  

ASM  

A412 Dual Reactor  

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Malta, New York
ASM A412 Vertical Furnace, 300mm, LPCVD As Doped Poly / TiN:
ASM A412 Vertical Furnace, 300mm, LPCVD As Doped Poly / TiN
Twin LPCVD As Doped Reactors

TOOL ID: FVX2561

Chemistry TiCl4, NH3, NF3, Cl2, SiH4, AsH4

2011 Vintage

 

Tool ID: FVX2561

183417
ASM  

ASM  

A412 Dual Reactor  

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Malta, New York
ASM A412 Vertical Furnace, 300mm, LPCVD As Dpoed Poly / TiN:
ASM A412 Vertical Furnace, 300mm, LPCVD As Dpoed Poly / TiN
Twin LPCVD As Doped Reactors

TOOL ID: FVX2560

Chemistry TiCl4, NH3, NF3, Cl2, SiH4, AsH4

2011 Vintage

 

Tool ID: FVX2560

183169
ASM  

ASM  

A412 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Malta, NY
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN:
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN
Twin LPCVD SiN Reactors

TOOL ID: FVX2541

2011 Vintage
183170
ASM  

ASM  

A412 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Malta, New York
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN:
ASM A412 Vertical Furnace, 300mm, LPCVD SiN & SiN
Twin LPCVD SiN Reactors

TOOL ID: FVX2540

2011 Vintage

 

Tool ID: FVX2541

 
196930
ASM  

ASM  

A300 VT 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Burlington, Vermont
ASM Advance 300 VT, Vertical Furnace, 200mm, Oxidation:
ASM Advance 300 VT,  Vertical Furnace, 200mm, Oxidation

Cold shutdown

Vintage 1997

S/N: 71F5669AE
196931
ASM  

ASM  

A300 VT 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Burlington, Vermont
ASM Advance 300 VT, Vertical Furnace, 200mm, Oxidation:
ASM Advance 300 VT,  Vertical Furnace, 200mm, Oxidation



S/N: 71F5669AC







196932
ASM  

ASM  

A300 VT 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Burlington, Vermont
ASM Advance 300 VT, Vertical Furnace, 200mm, Oxidation:
ASM Advance 300 VT,  Vertical Furnace, 200mm, Oxidation


Cold, Shutdown

S/N: 71F5669AE


195174
ASM  

ASM  

E3200  

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Dresden, Saxony
ASM, E3200, 300mm, Epi Deposition System:
ASM, E3200 Reduced Pressure, 300mm, Epi Deposition System
Epsilon 3200, Epitaxial Reactor

In the fab.

• Gas Loops:
– Nitrogen (N2) purge
– Hydrogen (H2) carrier and purge
– Hydrogen chloride (HCl) wafer and chamber etch
– Primary silicon source, dichlorosilane (SiH2Cl2, gas)
– Low flow hydrogen chloride (HCl)
– Auxiliary silicon source, silane (SiH4)
– Germanium source, germane (GeH4)
• Advanced application valving (for multilayer sharp-transition processing)

199194
ASM  

ASM  

E3200 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Dresden, Saxony
ASM, E3200, 300mm, Epi Deposition System:

ASM, E3200, 300mm, Epi Deposition System

Left Handed Reduced Pressure

FRONT END INTERFACE
Load Ports (Qty. 2) ISOPORT
FOUP ID Reader (RF), Qty. 2
Side Louvered Panels/Flat Top (Ballroom Configuration)
Light Tower - 4 position (STD)
Installation (2 per system):
Door Mounted on Wafer Transfer Module (Std)
FEI Mount (for Ballroom configuration)
Dual 25 wafer Loadlock

Vacuum Load Locks
Level 2
(VLL configured for two pumps: one dedicated
to LL#1 and LL #2 and one for WHC)
REACTOR MODULE
HCI Detector- Reactor
TEK

Gases (Unit/Clerity 8161 digital0
N2
H2 - 100slm
HCl - 30slm
B2H6 - 20/200/200
As3/Ph3 - 20/200/200
DCS - 500sccm
SiH4 - 500sccm
GeH4 - 200sccm

Bottom Services





199195
ASM  

ASM  

E3200  

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Dresden, Saxony
ASM, E3200, 300mm, Epi Deposition System:

ASM, E3200, 300mm, Epi Deposition System

Warm Idle
S/N: 034040

Right Handed System


195647
ASM  

ASM  

Epsilon 3200 

List all items of this typeChemical Vapor Deposition Equipment - Other

in Chemical Vapor Deposition Equipment

1   Dresden, Saxony
ASM, E3200, 300mm, Epi Deposition System:

ASM, E3200 Reduced Pressure, 300mm, Epi Deposition System

Epsilon 3200, Epitaxial Reactor

In the fab.

• Gas Loops:
– Nitrogen (N2) purge
– Hydrogen (H2) carrier and purge
– Hydrogen chloride (HCl) wafer and chamber etch
– Primary silicon source, dichlorosilane (SiH2Cl2, gas)
– Low flow hydrogen chloride (HCl)
– Auxiliary silicon source, silane (SiH4)
– Germanium source, germane (GeH4)
• Advanced application valving (for multilayer sharp-transition processing)

180601
ASML  

ASML  

/300 

List all items of this typeDeep UV Wafer Stepper

in Wafer Steppers

1   F* Temecula, California
ASML /300 DUV Stepper - 6":
ASML /300 - DUV Wafer Stepper - 6" Wafer
Refurbished condition, Lens data taken before decommissioning shows good lens quality.
Currently decomissioned, not available for testing.
Lens under N2 Purge, unit stored in cleanroom.
137544
Aviza Technology Ltd  

Aviza Technology Ltd  

Aviza Celsior mainframe for 12" / 300 mm 

List all items of this typeBenchtop LPVCD Furnaces

in LPCVD Furnaces

1   F* Regensburg, BY
Aviza Celsior mainframe:
Aviza Celsior mainframe



Aviza Celsior mainframe
Equipment Code: CVD304-04

LOCATION: Dresden
137540
Aviza Technology Ltd  

Aviza Technology Ltd  

Aviza Pantheon Mainframe for 12" / 300 mm 

List all items of this typeBenchtop LPVCD Furnaces

in LPCVD Furnaces

1   F* Regensburg, BY
Aviza Pantheon Mainframe:
Aviza Pantheon Mainframe
Equipment Code: CVD304-03


Aviza Pantheon Mainframe with 3 chambers
Serial Number: OX0412-005
178965
Axcelis Technologies  

Axcelis Technologies  

Optima HDxT 

List all items of this typeMedium Current Implanters

in Ion Implantation Equipment

1   F* Malta, NY
Axcelis Optima HDxT, Ion Implanter, 300mm, :
300mm ion implanter, spare beam tunnel, SRA, PFG, source, manipulator, bushing source flange adapter, source turbo exhaust line, and . chamber liners.

Axcelis Optima HDxT
 
Roughing Pumps:
Edwards IGX100L
Edwards iGX100M
Edwards iGX600M
 
Cryo Pumps:
Qty (2) Brooks: 320FE
Qty (1) Brooks: 250FE
 
Turbo Pump
TP1: Edwards STP-XA2703CV
TP2: Edwards STP-A1303CV
 
Chillers: 
Affinity J Chiller Model: GWN-ZRMK-BE55CBS6
Affinity F-Series Model: FWA-032K-DD19CBD4
 
Cryo Compressors:
Qty (2) Brooks: IS-1000
191094
Dainippon Screen  

Dainippon Screen  

SC-W60A-AV 

List all items of this typeManual Photoresist Coaters

in Photoresist Coaters

2   Villach, Carinthia
B604 SCREEN DNS SCW60B:
Coater with 4 horizontal load ports
2 coater cups
6 resist lines with 3 pumps
8 hot plates (2 of them ADH HP)
2 cool plates
1 temperature controller / unit
192501
Brewer Science  

Brewer Science  

300x 

List all items of this typeI-Line Wafer Stepper

in Wafer Steppers

1   Malta, New York
Brewer Science, 300 X, Resist Coater, 300mm:
Brewer Science,  300 X, Resist Coater, 300mm

Resist Coater
192586
Brewer Science  

Brewer Science  

300XD 

List all items of this typeManual Photoresist Coaters

in Photoresist Coaters

1   Malta, New York
Brewer Science, 300XD, Resist Developer, 300mm:
Brewer Science,  300XD, Resist Developer, 300mm
192500
Brewer Science  

Brewer Science  

CEE 2000 FX 

List all items of this typeI-Line Wafer Stepper

in Wafer Steppers

1   Malta, New York
Brewer Science, CEE 200 FX, Resist Coater, 300mm:
Brewer Science, CEE 200 FX, Resist Coater, 300mm

photoresist coater

192585
Brewer Science  

Brewer Science  

CEE 200 FX 

List all items of this typeManual Photoresist Coaters

in Photoresist Coaters

1   Malta, New York
Brewer Science, CEE 200 FX, Resist Developer, 300mm:
Brewer Science,  CEE 200 FX, Resist Developer, 300mm

Configured for 300mm Square substrates


197661
Canon  

Canon  

FPA-1550 M4-W 

List all items of this typeG-Line Wafer Steppers

in Wafer Steppers

1   F* Villach, Carinthia
178365
Ci Science  

Ci Science  

Torus 300K 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Taichung, Taichung City
Ci Science, Etch, Torus 300K 300mm:
Manufactured in 2005; Status: Bagged and Skidded


!!!MULTIPLE UNITS AVAILABLE!!! Please inquire  
199394
OnTrak Systems  

OnTrak Systems  

 

List all items of this typeCMP Polishers

in Chemical Mechanical Planarization Equipment

4   F*N* Regensburg, Bavaria
199395
IPEC Westech  

IPEC Westech  

IPEC472 

List all items of this typeCMP Polishers

in Chemical Mechanical Planarization Equipment

1   N* Kulim, Kedah
178259
Cressington  

Cressington  

208HR 

List all items of this typeStandalone Sputterers

in Deposition Equipment

1   F* Singapore
Cressington, Sputtering Systems, :
Manufactured in 1999
195725
Cymer  

Cymer  

EX-5700 

List all items of this typeDeep UV Wafer Stepper

in Wafer Steppers

1   F* Burlington, Vermont
Cymer, EX-5700, DUV Laser, 248nm, :
Cymer, EX-5700, DUV Laser, 248nm,  

for Nikon NSR-2205Ex14/12 248nm Steppers

S/N : 96CC701812

DOM : 1996
195726
Cymer  

Cymer  

EX-5700 

List all items of this typeDeep UV Wafer Stepper

in Wafer Steppers

1   F* Burlington, Vermont
Cymer, EX-5700, DUV Laser, 248nm, :
Cymer, EX-5700, DUV Laser, 248nm,  

for Nikon NSR-2205Ex14/12 248nm Steppers

S/N : 97CC703710

DOM : 1997
195768
Dainippon Screen  

Dainippon Screen  

SCW-60A-AV 

List all items of this typeManual Photoresist Coaters

in Photoresist Coaters

1   F* Villach, Carinthia
Dainippon Screen Coater:
Coater with 2 Coatercups
195767
Dainippon Screen  

Dainippon Screen  

SDW-60A-AVP 

List all items of this typeManual Photoresist Developers

in Photoresist Developers

1   Villach, Carinthia
Dainippon Screen Developer:
Developer with 2 Developercups
197510
Dainippon Screen  

Dainippon Screen  

SCW-60A-AV 

List all items of this typeStandard PR Coater Tracks

in Photoresist Coater Tracks

1   F* Villach, Carinthia
Dainippon Screen SCW-60A-AV:
Coater with 2 Coatercups
197633
Dainippon Screen  

Dainippon Screen  

SDW-60A-AVP 

List all items of this typeProgrammable Robotic Photoresist Develop Tracks

in Photoresist Develop Track Systems

1   Villach, Carinthia
Dainippon Screen SDW-60A-AVP:
Developer with 2 Developercups
157438
Dainippon Screen  

Dainippon Screen  

SDW60 AVP 

List all items of this typeStandard Photoresist DevTracks

in Photoresist Develop Track Systems

1   F* Regensburg, BY
Developer DNS SDW-60-AVP:
6 inch developer from dai nippon screen SDW-60-AVP, 2 developing units, full functional
180517
Dainippon Screen  

Dainippon Screen  

SDW-60-AVP 

List all items of this typeStandard Photoresist DevTracks

in Photoresist Develop Track Systems

1   F* Regensburg, BY
Developer DNS SDW-60-AVP:
6 inch developer from dai nippon screen SDW-60-AVP, 2 developing units, full functional
Location: Regensburg, Bavaria
199197
DNS  

DNS  

SS-3000 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Singapore
DNS SS-3000, 300mm, Wafer Scrubber, AquaSpin:

DNS SS-3000, 300mm, Wafer Scrubber, AquaSpin

Bagged & Skidded in Warehouse

199301
DNS  

DNS  

SS-3100 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   East Fishkill, New York
DNS SS-3100, 300mm, Wafer Scrubber, AquaSpin:
DNS SS-3100, 300mm, Wafer Scrubber, AquaSpin

In the Fab.  Warm Idle

This is an 8 chamber tool:
  • 4 topside process chambers
  • 4 backside process chambers


194723
Dainippon Screen  

Dainippon Screen  

FC-3000 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Taichung, Taichung City
DNS, Clean / Strip, FC-3000 300mm:
DNS, Clean / Strip, FC-3000 300mm

Process:  R-5-22, IPA/ACT935

S/N: 630300161A


!!!MULTIPLE UNITS AVAILABLE!!! Please inquire


195649
Dainippon Screen  

Dainippon Screen  

FC-3000 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Taichung, Taichung City
DNS, Clean / Strip, FC-3000 300mm:
DNS, Clean / Strip, FC-3000 300mm

S/N : 630300249A
195488
Dainippon Screen  

Dainippon Screen  

FC-3100 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Malta, New York
DNS, Clean / Strip, FC-3100 300mm:
DNS, Clean / Strip, FC-3100 300mm
195495
Dainippon Screen  

Dainippon Screen  

FC-3100 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Malta, New York
DNS, Clean / Strip, FC-3100 300mm:
DNS, Clean / Strip, FC-3100 300mm
199198
Dainippon Screen  

Dainippon Screen  

FC-3100 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Singapore
DNS, Clean / Strip, FC-3100 300mm:
DNS, Clean / Strip, FC-3100 300mm

Bagged & Skidded in Warehouse
199726
Dainippon Screen  

Dainippon Screen  

SC-80BW-AVQ 

List all items of this typeManual Photoresist Coaters

in Photoresist Coaters

1   Singapore
DNS, SC-80BW-AVQ, 200mm, PI Spin Coater:
DNS, SC-80BW-AVQ, 200mm, PI Spin Coater

Missing many Parts.

Parts tool only.
199727
Dainippon Screen  

Dainippon Screen  

SC-80BW-AVQ 

List all items of this typeManual Photoresist Coaters

in Photoresist Coaters

1   Singapore
DNS, SC-80BW-AVQ, 200mm, PI Spin Developer:
DNS, SC-80BW-AVQ, 200mm, PI Spin Developer

Major Parts Missing
In the fab.
182279
Ebara  

Ebara  

Electroplate UFP-300A 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   East Fishkill, NY
Ebara, 300mm, Plating Plater, Ni Cu PbSn, Lead Tin, Electroplate UFP-300A:
Ebara, 300mm, Plating Plater, Ni Cu PbSn, Lead Tin, Electroplate UFP-300A

Tool ID: PLT01

300mm Wafer Electroplating tool with 3 chemistry capability

TOOL IS MISSING PARTS.  Shutdown 9/2015
182277
Ebara  

Ebara  

Electroplate UFP-200/300A 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   East Fishkill, NY
Ebara, 300mm, Plating Plater, PbSn, Lead Tin, Electroplate UFP-200/300A:
Ebara, 300mm, Plating Plater, PbSn, Lead Tin, Electroplate UFP-200/300A
Tool ID:  PLT02

300mm Wafer Electroplating tool with 3 chemistry capability

TOOL IS MISSING PARTS.  Shutdown 9/2015

197965
ASM  

ASM  

Epsilon 3200 

List all items of this typeEpitaxial Cluster Tools

in Epitaxial Reactors

1   F* Villach, Carinthia
EPI ASM:
ASM EPI Epsilon 3200
176318
EVG  

EVG  

EVG850TB/200  

List all items of this typeWafer Fabrication Equipment - Other

in Wafer Fabrication Equipment

1   Regensburg, BY
EVG850 Waferbonder:
EVG850 Waferbonder, Year of Construction 2007
176319
EVG  

EVG  

EVG850TB/200 

List all items of this typeWafer Fabrication Equipment - Other

in Wafer Fabrication Equipment

1   Regensburg, BY
EVG850 waferbonder:
EVG850 Waferbonder year of Construction 2005
176359
EVG  

EVG  

EVG850DB/200  

List all items of this typeWafer Fabrication Equipment - Other

in Wafer Fabrication Equipment

1   Regensburg, BY
EVG850DB/200 Wafer Debonder:
EVG850DB/200  Wafer Debonder for 150mm Wafers
188898
FSI  

FSI  

ORION 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Dresden, Saxony
FSI Orion, TEL, 300mm, Surface Preparation:
FSI Orion, TEL, 300mm, Surface Preparation

EKC
Di Water
dilute HF

Back end process

199678
FSI  

FSI  

Mercury MP 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Singapore
FSI, Mercury MP, 200mm, Wet Clean, Spray Processor:
FSI, Mercury MP, 200mm, Wet Clean, Spray Processor

chemical used are H2SO4, H2O2, NH4OH, HF.
Maintenance history is not available.


Bagged and Skidded in warehouse.

Comes with PFA turntable!


195385
FSI  

FSI  

Scorpio 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   F* East Fishkill, New York
FSI, Scorpio, Resist Develop Tool, 200mm:
FSI, Scorpio, Resist Develop Tool, 200mm

S/N : S-0850
196207
FSI  

FSI  

Scorpio 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   East Fishkill, New York
FSI, Scorpio, Wet Developer, 200mm,:
FSI, Scorpio, Wet Developer, 200mm,

S/N : S-0849

!! Multiple Units Available !!  Please inquire.


137566
Tokyo Electron Ltd  

Tokyo Electron Ltd  

OfenTel Minibatch (NITRID) for 12" / 300 mm 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Regensburg, BY
Furnace TEL Minibatch (NITRID):
OfenTel Minibatch (NITRID)
Equipment Code: OFE361-01

TEL Formula Minibatch furnace for Nitride, 4


OfenTel Minibatch (NITRID)
Serial Number: P00000315001
137567
Tokyo Electron Ltd  

Tokyo Electron Ltd  

OfenTel Minibatch (OXID) for 12" / 300 mm 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Regensburg, BY
FurnaceTel Minibatch (OXID):
OfenTel Minibatch (OXID)
Equipment Code: OFE361-02

TEL Formula Minibatch furnace for Oxide


OfenTel Minibatch (OXID)
Serial Number: P00000315002
183751
GTX Marketing  

GTX Marketing  

Wet Bench 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Singapore
GTX Marketing, 200mm, Wet Sink, Support:
GTX Marketing, 200mm, Wet Sink, Support

Tool ID: CPWS-01
199730
Hitachi  

Hitachi  

M-511AE 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Singapore
Hitachi, KASADO, M-511AE, Microwave Etch, 200mm, Poly gate etch:
Hitachi, KASADO, M-511AE, Microwave Etch, 200mm, Poly gate etch

S/N: 97L047501

Major Parts Missing

Loader Unit
Load Lock Unit
Buffer Room 
Etching Chamber Unit 
Mass Flow Controller Unit 
Ashing Chamber unit 


In the Fab
199731
Hitachi  

Hitachi  

M-511AE 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Singapore
Hitachi, KASADO, M-511AE, Microwave Etch, 200mm, Poly gate etch:
Hitachi, KASADO, M-511AE, Microwave Etch, 200mm, Poly gate etch

S/N: 97L047701

Major Parts Missing:
Loader Unit
Load Lock Unit
Buffer Room 
Etching Chamber Unit 
Mass Flow Controller Unit 
Ashing Chamber unit 


Core tool

Still in the fab
191158
Hitachi  

Hitachi  

LA-3100 

List all items of this typeLithography Equipment - Other

in Lithography Equipment

1   Singapore
Hitachi, LA-3100, Registration Analyzer, 200mm.:
Hitachi, LA-3100, Registration Analyzer, 200mm.

Many Missing Parts.  

KNOWN Missing Parts.DESCRIPTIONQty
Main BodyCPU1
Main BodyTransfer Arm1
Main BodyMotor6
Main Bodyoptic Lens5
Main BodyPCB15
Main BodyDriver 2
Main BodyPower unit1
Main BodyLamp House1
Main BodyStage1
199732
KEM  

KEM  

Lambda Strip 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Singapore
KEM, Lambda Strip, Resist Stripper, 200mm:
KEM, Lambda Strip,  Resist Stripper, 200mm

Major Parts Missing

In the fab.

!!!MULTIPLE UNITS AVAILABLE !!!  PLEASE INQUIRE
199733
KEM  

KEM  

Lambda Strip 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Singapore
KEM, Lambda Strip, Resist Stripper, 200mm:
KEM, Lambda Strip,  Resist Stripper, 200mm

Major Parts Missing

In the fab.


!!! MULTIPLE UNITS AVAILABLE!!!  PLEASE INQUIRE 
199835
Kokusai  

Kokusai  

BDF41 

List all items of this typeHorizontal Diffusion Furnaces

in Diffusion Furnaces

1   N* Villach, Carinthia
Kokusai Furnance BDF41:
4 Tubes
Tube 1      Oxid
Tube 2+3  Teos
Tube 4      Poly
190993
Kokusai  

Kokusai  

Quixace Ultimate 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Malta, New York
Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF:

Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF

Low Temp Steam Anneal - for SOD Cure

S/N: T2DD6-18711

190748
Kokusai  

Kokusai  

DJ-1236VN-DF 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Malta, New York
Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF, ALD-TiN:
Kokusai Quixace Ultimate, 300mm,  DJ-1236VN-DF

S/N T2DC6-16590

ALD TiN

Tool is New In Box, with New Quartz.  Never installed.
190749
Kokusai  

Kokusai  

DJ-1236VN-DF 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Malta, New York
Kokusai Quixace Ultimate, 300mm, DJ-1236VN-DF, ALD-TiN:
Kokusai Quixace Ultimate, 300mm,  DJ-1236VN-DF

S/N: T2DC6-16595

ALD TiN
180506
Kokusai  

Kokusai  

DJ-1236VN-DF 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   F* Dresden, Saxony
Kokusai Quixace Ultimate, 300mm, MT-TiN, DJ-1236VN-DF:
Kokusai Quixace Ultimate, 300mm, MT-TiN, DJ-1236VN-DF
TiCl4, NH3 - Process for TiN - Prior Use

Cartridge Heater - D4EX22250, RHC2 Heater
Number of control zone, 5 zones
Heater element material - KANTHAL APM
Maximum heating temperature range - 1050 degC (in Furnace)
Flat zone length - 800mm (±2.0 degC at 800 degC)
Main Controller(OU) - D4EX38403(KDSC-2007CONT), Made by HKDE
Core2Duo 2.16GHz, 2.0GB, 80GB (RAID1), 100BASE-TX 3Ch, USB2.0
Main Operation Unit - TM150-HKT05 
Sub Operation Unit - D4EX40577
Bottle Heater (For Ta Source) - E-0456-17, Tokyo Gikken
Bottle Heater (For Ta Source) - E-0456-17, Made by Tokyo Gikken
Bubbling UNIT (For Ti Source) - D4EX31240, Made by Schumacher
Bottle (For Ti Source) - BK1200URK, Made by Schumacher
N2 Purge Load Lock System
O2 Monitor / Detector - SH-305(RX-501052), Made by ENEGY SUPPORT
FOUP Opener N2 Purge SYSTEM - Made by HITACHI KOKUSAI

PUMPS INCLUDED.  See Photo attached.

S/N: T2DC6-15901
194725
Kokusai  

Kokusai  

DD-1206V-DF 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Taichung, Taichung City
Kokusai Quixace, 300mm, DD-1206V-DF:
Kokusai Quixace, 300mm, DD-1206V-DF

LP SiN 

S/N : T2DC6-13303

!!! MULTIPLE UNITS AVAILABLE !!!  Please inquire
190750
Kokusai  

Kokusai  

DD-1223VN 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Malta, New York
Kokusai Quixace, 300mm, DD-1223VN, ALD-TiN:
Kokusai Quixace, 300mm, DD-1223VN

ALD-TiN 

S/N T2DC6-16441
195356
Kokusai  

Kokusai  

DJ-1206VN-DM 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore
Kokusai Quixace, 300mm, DJ-1206VN-DM, LPCVD SiN:
Kokusai Quixace, 300mm, DJ-1206VN-DM, LPCVD SiN

S/N : T1DC6-13301

Tool is Crated in warehouse in Singapore.

!!!Multiple Units Available!!!  Please inquire
199768
Kokusai  

Kokusai  

Quixace-II 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Taichung, Taichung City
Kokusai Quixace, 300mm, Quixace-II:
Kokusai Quixace, 300mm, Quixace-II

Doped Poly




S/N: P2DC7-14115-1
199736
Kokusai  

Kokusai  

DJ-835V (L/L) 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore
KOKUSAI, 200mm, DJ-835V (L/L), Doped Poly Vertical Furnace:
KOKUSAI, 200mm, DJ-835V (L/L), Doped Poly Vertical Furnace

Major Parts Missing
Baratron & F-pipe 
APC & APC controller 
All TCs 
Mechanical Drivers 
E-cap 
sequencer 
TPU 
sequencer optical cable
AV74 & check valve
Transfer robot 
Mechanical motors 
Necha controller 
VS sensor & solenoid valve 
Pressure indicator 
Main valve  
Thermo switches 
Baratron flexible pipe 
Loader cables (whole set) 
Tape heater controller 
Main contoller CX3002B 
Elevator 
Gas controller 
Flange 
All exhaust pipes 
Temp controller 
Heater 
Vacuum pump


In the fab.

S/N: DC2-10813-1
199737
Kokusai  

Kokusai  

DJ-853V 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore
KOKUSAI, 200mm, DJ-853V, HTO, DCS, Vertical Furnace:

KOKUSAI, 200mm, DJ-835V, HTO, DCS,  Vertical Furnace

Major parts Missing

In the Fab.

S/N: DC3-10955-2

199738
Kokusai  

Kokusai  

DJ-835V 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore
KOKUSAI, 200mm, DJ-853V, LPCVD DCS SiN, Vertical Furnace:
KOKUSAI, 200mm, DJ-853V, LPCVD DCS SiN, Vertical Furnace

Major Parts Missing

In the fab.

S/N: DC3-00221-1
199741
Kokusai  

Kokusai  

DJ-853V 

List all items of this typeVertical LPCVD Furnaces

in LPCVD Furnaces

1   Singapore
KOKUSAI, 200mm, DJ-853V, LPCVD SiN, DCS, Vertical Furnace:
KOKUSAI, 200mm, DJ-853V, LPCVD SiN, DCS,  Vertical Furnace

Major Parts Missing.

In the fab.

S/N: DC2-10820-1
191535
LAM Research Corp.  

LAM Research Corp.  

2300 ELD 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Dresden, Saxony
LAM, 2300 ELD, WCoP, Electroless Depositon, 300mm:
LAM, 2300 ELD, WCoP, Electroless Depositon, 300mm
191536
LAM Research Corp.  

LAM Research Corp.  

2300 ELD 

List all items of this typeWet Process Equipment - Other

in Wet Processing Equipment

1   Dresden, Saxony
LAM, 2300 ELD, WCoP, Electroless Depositon, 300mm:
LAM, 2300 ELD, WCoP, Electroless Depositon, 300mm

196765
LAM  

LAM  

2300 Exelan Flex 

List all items of this typePlasma Processing Equipment and Tools - Other

in Plasma Processing Equipment

1   Taichung, Taichung City
LAM, 2300 Exelan Flex, 300mm, Oxide Etcher:
LAM, 2300 Exelan Flex, 300mm, Oxide Etcher

MISSING PARTS TOOL !!! 

Parts Missing:
qty. 1 Flex45 Chamber
qty. 1 Flex45 Chamber
qty. 1 Flex45 Chamber
qty. 1 LAM2300 ATM Robot o-ring
qty. 1 RING,HE,38X ESC,RND,300M

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*   Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

NOTE:
   photo available
   reference document attached
  F* if the item is specially featured
  N* if the item is newly added, and/or
  R* if the item's price is recently reduced.

Items from the following manufacturers are offered under Wafer Fabrication Equipment:
Accent Optical, Amerimade Technologies, Applied Materials Inc., Applied Materials, Inc., ASM, ASML, Aviza Technology Ltd., Axcelis Technologies GmbH, Brewer Science, Canon, Ci Science, Cressington, Cymer, Dainippon Screen Mfg. Co., Ltd., DNS, Ebara, EVG, FSI, GTX Marketing, Hitachi, IPEC Westech, KEM, Kokusai, LAM, LAM Research Corp., Levitech, Mattson Technology, Microtech, Modutek, Nanometrics, Nikon, Nikon, Novellus Systems, OnTrak Systems, Picosun, PSK, Quintel, Samco, SANKYO, Scientech, Semi-Tool, Semitool, Shibaura, Silicon Valley Group, Sokudo, Steag-Mattson, Suss MicroTec, Takatori, Tel, TEL Corp., Tokyo Electron Limited, Tokyo Electronics Limited, Ultratech, Inc., Universal Plastics Corporation, Varian, WENESCO