 |
Item ID |
Photo |
Short Description |
Product Type / Details |
#
|
Price |
Notes |
Location |
Make |
Model |
|
|
$ |
|
 |
254253
|
Fusion Systems Inc.
|
Fusion Systems Inc. |
200AC/ACU |
in Plasma Processing Equipment
|
1
|
|
|
 |
Burlington, Vermont |
|
 |
254155
|
Gasonics
|
Gasonics |
PEP3510A/A(L) |
in Plasma Resist Strippers
GASONICS PEP3510A/A(L), 200mm, s/n: M981940:PHOTORESIST STRIPPING
|
1
|
|
|
 |
Singapore |
|
 |
254156
|
Gasonics
|
Gasonics |
PEP3510A/A(L) |
in Plasma Resist Strippers
GASONICS PEP3510A/A(L), 200mm, s/n: M982690:PHOTORESIST STRIPPING
|
1
|
|
|
 |
Singapore |
|
 |
252342
|
Hitachi Kokusai Elec
|
Hitachi Kokusai Elec |
Quixace - DJ-1236VN-DF |
in LPCVD Furnaces
|
1
|
|
|
 |
Malta, New York |
|
 |
254361
|
Hitachi Kokusai Elec
|
Hitachi Kokusai Elec |
Quixace - DJ-1236VN-DF |
in LPCVD Furnaces
|
1
|
|
|
 |
Malta, New York |
|
 |
254105
|
Hitachi High-Technol
|
Hitachi High-Technol |
M8000 - M8190XT |
in Chemical Vapor Deposition Equipment
HITACHI M8000 - M8190XT, 300mm, s/n: 12DN20301:ETC_SpacerEtch
|
1
|
|
|
 |
Malta, New York |
|
 |
238643
|
PVA TePla
|
PVA TePla |
TWIN |
in Wafer Fabrication Equipment
|
1
|
|
|
 |
Villach, Carinthia |
|
 |
256920
|
Varian
|
Varian |
Viision 200+ |
in Ion Implantation Equipment
Implanter Varian Viision 200+:200 mm Implanter in very good condition Price net 982k$ based on Incoterm FCA, as is without warranty
|
1
|
|
982,263.16 |
N* |
Villach, Carinthia |
|
 |
255371
|
Suss MicroTec
|
Suss MicroTec |
ACS200 Gen3 |
in Wafer Fabrication Equipment
InkJet Printer (Süss ACS200):Süss Micro Tec ACS200 Gen 3
|
1
|
|
|
 |
Regensburg, Bavaria |
|
 |
254473
|
InnerSense
|
InnerSense |
Load Port - P/N: ALP613A |
in Lithography Equipment
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
254364
|
InnerSense
|
InnerSense |
Load Port - P/N: ALP613A |
in Lithography Equipment
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
254251
|
Jusung Engineering L
|
Jusung Engineering L |
Eureka 2000 |
in Chemical Vapor Deposition Equipment
|
1
|
|
|
 |
Burlington, Vermont |
|
 |
253369
|
KLA-Tencor
|
KLA-Tencor |
5200 |
in Lithography Equipment
|
1
|
|
|
 |
Burlington, Vermont |
|
 |
254368
|
KLA-Tencor
|
KLA-Tencor |
TERON 650 |
in Lithography Equipment
|
1
|
|
|
 |
Malta, New York |
|
 |
255099
|
LAM Research Corp.
|
LAM Research Corp. |
2300 Exelan Flex |
in Plasma Processing Equipment
LAM 2300 Exelan Flex, 300mm, s/n: 93180:Oxide ETCH
|
1
|
|
|
|
Singapore |
|
 |
249968
|
LAM Research Corp.
|
LAM Research Corp. |
Dual Speed |
in Plasma Processing Equipment
|
1
|
|
|
 |
East Fishkill, New York |
|
 |
253032
|
LAM Research Corp.
|
LAM Research Corp. |
9600 BRME |
in Chemical Vapor Deposition Equipment
|
1
|
|
|
 |
Burlington, Vermont |
|
 |
256750
|
LAM Research Corp.
|
LAM Research Corp. |
Alliance 9400 PTX |
in Cluster Plasma Tools
LAM Alliance 9400 PTX:Mainframe with 3 Plasmachambers C-Upgrade in 2024 Mainframe and 2 Plasmachambers fully usable 1 Plasmachamber Hardware incomplete
|
1
|
|
|
N* |
Regensburg, Bavaria |
|
 |
252619
|
LAM Research Corp.
|
LAM Research Corp. |
C3-SPEED |
in Chemical Vapor Deposition Equipment
LAM C3-SPEED, 300mm, s/n: 03-9-C30214:300MM WTS with 2 HDP STI oxide chambers
|
1
|
|
|
 |
East Fishkill, New York |
|
 |
255827
|
LAM Research Corp.
|
LAM Research Corp. |
2300 Kiyo |
in Cluster Plasma Tools
Lam Kiyo Chamber L2301-B:Semiconductor ETC Chamber with RF Cart Incl. Gasbox and Rocker Valve in production until January 2023
|
1
|
|
|
 |
Villach, Carinthia |
|
 |
254145
|
LAM Research Corp.
|
LAM Research Corp. |
Novellus Speed |
in Plasma Processing Equipment
|
1
|
|
|
 |
Singapore |
|
 |
254144
|
LAM Research Corp.
|
LAM Research Corp. |
Novellus Speed |
in Plasma Processing Equipment
|
1
|
|
|
 |
Singapore |
|
 |
254139
|
LAM Research Corp.
|
LAM Research Corp. |
Novellus Speed |
in Chemical Vapor Deposition Equipment
|
1
|
|
|
 |
Singapore |
|
 |
254146
|
LAM Research Corp.
|
LAM Research Corp. |
Novellus Speed |
in Chemical Vapor Deposition Equipment
|
1
|
|
|
 |
Singapore |
|
 |
219677
|
LAM Research Corp.
|
LAM Research Corp. |
INOVA |
in Plasma Processing Equipment
LAM, INOVA, 300mm, S/N 007823-0389:LAM, INOVA, 300mm, S/N 007823-0389
|
1
|
|
|
 |
Malta, New York |
|
 |
254226
|
Lasertec
|
Lasertec |
BI100 |
in Lithography Equipment
Lasertec BI100, s/n: BA002A408JR:EUV Reticle Back Side Inspection
|
1
|
|
|
 |
Malta, New York |
|
 |
254142
|
Mattson Technology
|
Mattson Technology |
ASPEN 2 |
in Plasma Resist Strippers
|
1
|
|
|
 |
Singapore |
|
 |
254143
|
Mattson Technology
|
Mattson Technology |
ASPEN 2 |
in Plasma Resist Strippers
|
1
|
|
|
 |
Singapore |
|
 |
254140
|
Mattson Technology
|
Mattson Technology |
ASPEN 2 |
in Plasma Resist Strippers
|
1
|
|
|
 |
Singapore |
|
 |
254141
|
Mattson Technology
|
Mattson Technology |
ASPEN 2 |
in Plasma Resist Strippers
|
1
|
|
|
 |
Singapore |
|
 |
241157
|
Mattison
|
Mattison |
MILLIOS HVM |
in Plasma Processing Equipment
Mattson, MILLIOS HVM, 300mm, s/n: 11043001, 09130001, 09250001:Mattson, MILLIOS HVM, 300mm, s/n: 11043001, 09130001, 09250001
|
1
|
|
|
 |
Malta, New York |
|
 |
249043
|
Nexx Systems
|
Nexx Systems |
STRATUS S300 |
in Plasma Processing Equipment
NEXX STRATUS S300, 300mm, s/n: S00000131:PLT03 NEXX STRATUS S300-FX ELECTROPLATING TOOL with ANCOSYS AUTOMATED ANALYSIS AND DOSING Unit
|
1
|
|
|
 |
East Fishkill, New York |
|
 |
249044
|
Nexx Systems
|
Nexx Systems |
APOLLO HP |
in Plasma Processing Equipment
NEXX APOLLO HP, 300mm, s/n: 379:TEL NEXX APOLLO HP PVD SYSTEM SPT03
|
1
|
|
|
 |
East Fishkill, New York |
|
 |
256294
|
Nexx Apollo PVD
|
Nexx Apollo PVD |
in Batch Sputtering Tools
Nexx Apollo PVD:The Nexx Apollo PVD system is a fully automated Physical Vapor Deposition (PVD) tool using a multiple wafer multiple chamber design. The system deposits thin metal films used in interconnect metallization on wafers. It uses a staged vacuum system that allow short pump down time to achieve ultra high vacuum. The multi chamber design allows for precise control over all process parameters.
|
1
|
|
|
N* |
Kulim, Kedah |
|
 |
257163
|
Nikon
|
Nikon |
NSR-S208D |
in Wafer Steppers
|
1
|
|
|
N* |
Dresden, Saxony |
|
 |
257165
|
Nikon
|
Nikon |
NSR-S208D |
in Wafer Steppers
|
1
|
|
|
N* |
Dresden, Saxony |
|
 |
257164
|
Nikon
|
Nikon |
NSR-S208D |
in Wafer Steppers
|
1
|
|
|
N* |
Dresden, Saxony |
|
 |
254329
|
Nikon
|
Nikon |
S208D |
in Wafer Steppers
|
1
|
|
|
 |
Singapore |
|
 |
248319
|
Nikon
|
Nikon |
NSR-2205EX14C |
in Wafer Steppers
Nikon, NSR-2205EX14C, 200mm, S/N 7573113:Nikon, NSR-2205EX14C, 200mm, S/N 7573113
|
1
|
|
|
 |
Singapore |
|
 |
248320
|
Nikon
|
Nikon |
NSR-2205EX14C |
in Wafer Steppers
Nikon, NSR-2205EX14C, 200mm, S/N 7573120:Nikon, NSR-2205EX14C, 200mm, S/N 7573120
|
1
|
|
|
 |
Singapore |
|
 |
249907
|
Nikon
|
Nikon |
NSR-S208D |
in Wafer Steppers
NIKON, NSR-S208D, 300mm, s/n: 8732039. LKSC760:NIKON Main Body
|
1
|
|
|
 |
Singapore |
|
 |
247027
|
Nikon
|
Nikon |
NSR-S208D |
in Wafer Steppers
NIKON, NSR-S208D, 300mm, s/n: 8732048:NIKON, NSR-S208D, 300mm, s/n: 8732048 Lithography Step and repeat scanning system
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
247605
|
Nikon
|
Nikon |
NSR-S208D |
in Wafer Steppers
NIKON, NSR-S208D, 300mm, s/n: S62 0290202:Lithography Step and repeat scanning system
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
239647
|
Novellus Systems
|
Novellus Systems |
INOVA NEXT |
in Plasma Processing Equipment
NOVELLUS, INOVA NEXT, s/n M23321A, 300mm:NOVELLUS, INOVA NEXT, s/n M23321A, 300mm
|
1
|
|
|
 |
Malta, New York |
|
 |
254376
|
Oerlikon
|
Oerlikon |
Clusterline 300 |
in Plasma Processing Equipment
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
244285
|
Oxford Instruments
|
Oxford Instruments |
OPAL |
in Plasma Processing Equipment
OXFORD INSTRUMENTS, OPAL, sn: 94-220255, RF/Plasma oxide deposition tool:OXFORD INSTRUMENTS, OPAL, sn: 94-220255, RF/Plasma oxide deposition tool
|
1
|
|
|
 |
Malta, New York |
|
 |
239644
|
Ramgraber
|
Ramgraber |
SST |
in Wet Processing Equipment
Ramgraber SST:Used Configuration: Tank 1: EKC Tank 2: P1331 Tank 3 and 4: DMF Tank 5: IPA Known errors: Filter from tank 4 is leaking Heater 1 from tank 4 is broken Heater 3 from tank 4 is broken
|
1
|
|
|
F* |
Villach, Carinthia |
|
 |
253449
|
SEMIgear
|
SEMIgear |
Geneva STP300 |
in Plasma Processing Equipment
SEMIgear Geneva STP300, 300mm, s/n: S16100110:Solder Reflow + Tin Shell Bake
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
249042
|
SEMIgear
|
SEMIgear |
Geneva |
in Plasma Processing Equipment
SEMIgear Geneva, 300mm, s/n: S16100101:RFL02 SemiGEAR Reflow Tool
|
1
|
|
|
 |
East Fishkill, New York |
|
 |
256749
|
Semitool
|
Semitool |
Cintillio SAT |
in Wet Processing Equipment
Semitool Cintillio SAT:Toolcontroller with Windows XP Remote controller Ready for endpointdetection system Process: Copper / Titan-Wolfram / dHF (dilluted HF) div. spareparts possible (negotiable)
|
1
|
|
|
N* |
Regensburg, Bavaria |
|
 |
254138
|
SEZ
|
SEZ |
203 |
in Wet Processing Equipment
|
1
|
|
|
 |
Singapore |
|
 |
240477
|
SOLVISION
|
SOLVISION |
PRECIS 3D |
in Plasma Processing Equipment
SOLVISION, PRECIS 3D, s/n: C1W010150609:SOLVISION, PRECIS 3D, s/n: C1W010150609
|
1
|
|
|
F* |
Dresden, Saxony |
|
 |
255447
|
Speedfam
|
Speedfam |
Auriga C |
in Chemical Mechanical Planarization Equipment
Speedfam Auriga C: Oxid Prozess Wafer edge cleaner, EVCII PC, SW 8.601 Conditioner new type Flowcontroller für Slurry #2, additional Carrier rinse option CLC DI and chemical option at Wafer cleaner station
|
1
|
|
|
 |
Regensburg, Bavaria |
|
 |
252586
|
LAM Research Corp.
|
LAM Research Corp. |
SEZ SP 203 |
in Wet Processing Equipment
Spin Etch Tool (8''tool):Spin Etch Tool (8''tool)
|
1
|
|
|
 |
Kulim, Kedah |
|
 |
249036
|
Suss MicroTec
|
Suss MicroTec |
ACS200 Gen3 |
in Photoresist Coaters
Suss ACS200 Gen3, sn: ACS300GEN2-001151, 300 mm:Suss ACS200 Gen3, sn: ACS300GEN2-001151, 300 mm Suss spray coater
|
1
|
|
|
 |
East Fishkill, New York |
|
 |
254475
|
Tel
|
Tel |
ACT12 |
in Photoresist Coaters
|
1
|
|
|
 |
Singapore |
|
 |
254137
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
|
1
|
|
|
 |
Singapore |
|
 |
250840
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
|
1
|
|
|
 |
Singapore |
|
 |
250841
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
|
1
|
|
|
 |
Singapore |
|
 |
250847
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
|
1
|
|
|
 |
Singapore |
|
 |
251748
|
Tel
|
Tel |
Alpha 303i |
in Plasma Processing Equipment
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
250977
|
Tel
|
Tel |
ALPHA 8S |
in Plasma Processing Equipment
|
1
|
|
|
 |
Singapore |
|
 |
250978
|
Tel
|
Tel |
ALPHA 8S |
in Plasma Processing Equipment
|
1
|
|
|
 |
Singapore |
|
 |
251093
|
Tel
|
Tel |
Alpha-303i |
in Plasma Processing Equipment
|
1
|
|
|
 |
Singapore |
|
 |
251094
|
Tel
|
Tel |
Alpha-303i |
in Plasma Processing Equipment
|
1
|
|
|
 |
Singapore |
|
 |
254125
|
Tel
|
Tel |
ALPHA-808S |
in Plasma Processing Equipment
|
1
|
|
|
 |
Singapore |
|
 |
254133
|
Tel
|
Tel |
ALPHA-808S |
in Plasma Processing Equipment
|
1
|
|
|
 |
Singapore |
|
 |
254128
|
Tel
|
Tel |
ALPHA-808S |
in Plasma Processing Equipment
|
1
|
|
|
 |
Singapore |
|
 |
254129
|
Tel
|
Tel |
ALPHA-808S |
in Plasma Processing Equipment
|
1
|
|
|
 |
Singapore |
|
 |
254130
|
Tel
|
Tel |
ALPHA-808S |
in Plasma Processing Equipment
|
1
|
|
|
 |
Singapore |
|
 |
251089
|
Tel
|
Tel |
ALPHA-808S |
in Plasma Processing Equipment
|
1
|
|
|
 |
Singapore |
|
 |
254135
|
Tel
|
Tel |
ALPHA-808SC |
in Plasma Processing Equipment
|
1
|
|
|
 |
Singapore |
|
 |
254127
|
Tel
|
Tel |
ALPHA-808SC |
in Plasma Processing Equipment
|
1
|
|
|
 |
Singapore |
|
 |
254136
|
Tel
|
Tel |
ALPHA-808SC |
in Plasma Processing Equipment
|
1
|
|
|
 |
Singapore |
|
 |
254131
|
Tel
|
Tel |
ALPHA-8S-D |
in Plasma Processing Equipment
|
1
|
|
|
 |
Singapore |
|
 |
254132
|
Tel
|
Tel |
ALPHA-8S-Z |
in Plasma Processing Equipment
|
1
|
|
|
 |
Singapore |
|
 |
254134
|
Tel
|
Tel |
ALPHA-8S-Z |
in Plasma Processing Equipment
|
1
|
|
|
 |
Singapore |
|
 |
254126
|
Tel
|
Tel |
ALPHA-8S-Z |
in Plasma Processing Equipment
|
1
|
|
|
 |
Singapore |
|
 |
251090
|
Tel
|
Tel |
ALPHA-8S-Z |
in Plasma Processing Equipment
|
1
|
|
|
 |
Singapore |
|
 |
250314
|
Tel
|
Tel |
ALPHA-8S-Z |
in Plasma Processing Equipment
|
1
|
|
|
 |
Singapore |
|
 |
257154
|
Tel
|
Tel |
FORMULA-1S-H |
in Plasma Processing Equipment
|
1
|
|
|
N* |
Singapore |
|
 |
257155
|
Tel
|
Tel |
FORMULA-1S-H |
in Plasma Processing Equipment
|
1
|
|
|
N* |
Singapore |
|
 |
257156
|
Tel
|
Tel |
FORMULA-1S-H |
in Plasma Processing Equipment
|
1
|
|
|
N* |
Singapore |
|
 |
254477
|
Tel
|
Tel |
LITHIUS PRO-I |
in Photoresist Coaters
|
1
|
|
|
 |
Singapore |
|
 |
254106
|
Tel
|
Tel |
Lithius ProV |
in Photoresist Coaters
|
1
|
|
|
 |
Malta, New York |
|
 |
254101
|
Tel
|
Tel |
Lithius ProVi |
in Photoresist Coaters
TEL Lithius ProVi, 300mm, s/n: V110231:Immersion Coat and Develop
|
1
|
|
|
 |
Malta, New York |
|
 |
254102
|
Tel
|
Tel |
Lithius ProVi |
in Photoresist Coaters
TEL Lithius ProVi, 300mm, s/n: V110233:Immersion Coat and Develop
|
1
|
|
|
 |
Malta, New York |
|
 |
254103
|
Tel
|
Tel |
Lithius ProVi |
in Photoresist Coaters
TEL Lithius ProVi, 300mm, s/n: V120318:Immersion Coat and Develop
|
1
|
|
|
 |
Malta, New York |
|
 |
254240
|
Tel
|
Tel |
Lithius ProVi |
in Photoresist Coaters
|
1
|
|
|
 |
Malta, New York |
|
 |
255441
|
Tel
|
Tel |
LITHIUS |
in Photoresist Coaters
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
257159
|
Tel
|
Tel |
LITHIUS |
in Photoresist Coaters
TEL LITHIUS, 300mm, s/n: MD-G360588:2-Block-Machine
|
1
|
|
|
N* |
Dresden, Saxony |
|
 |
257160
|
Tel
|
Tel |
LITHIUS |
in Photoresist Coaters
TEL LITHIUS, 300mm, s/n: MD-G360844:2-Block-Machine
|
1
|
|
|
N* |
Dresden, Saxony |
|
 |
255442
|
Tel
|
Tel |
LITHIUS |
in Photoresist Coaters
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
255443
|
Tel
|
Tel |
LITHIUS |
in Photoresist Coaters
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
257161
|
Tel
|
Tel |
LITHIUS |
in Photoresist Coaters
TEL LITHIUS, 300mm, s/n: MDG360846:2-Block-Machine
|
1
|
|
|
N* |
Dresden, Saxony |
|
 |
251087
|
Tel
|
Tel |
MARK8 |
in Photoresist Coaters
|
1
|
|
|
 |
Singapore |
|
 |
250488
|
Tel
|
Tel |
MK7-S |
in Lithography Equipment
TEL MK7-S Coater_Developer:missing parts: 2 resist pumps, 1Developer Line Add. Info: TYP A1 M/C Typ FC-9801F#1 SD/HD Typ Commandpost System Vers. MK8G2.38 Alarm File ALM00166.OEN Sp. Al.File AL00TT.OEN GEM 1.72 Lines 1(3) Pumps 1xmini EBR programable T/H-Controller Semifab CD200 Backrinse yes Lines 1 x H-Nozzle Rinse yes Backrinse yes Last Time in production 1/1/24
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
250489
|
Tel
|
Tel |
MK7-S |
in Lithography Equipment
TEL MK7-S Coater_Developer:missing parts: 2 resist pumps, 1Developer Line Add. Info: TYP A M/C Typ FC-9801F#1 SD/HD Typ Commandpost System Vers. MK8G2.38 Alarm File ALM00166.OEN Sp. Al.File AL00TT.OEN GEM 1.72 Lines 1(3) Pumps 1xmini EBR programable T/H-Controller Semifab CD200 Backrinse yes Lines 1 x H-Nozzle Rinse yes Backrinse yes Last Time in production 1/1/24
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1
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Dresden, Saxony |
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250490
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Tel
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Tel |
MK7-S |
in Lithography Equipment
TEL MK7-S Coater_Developer:missing parts: 2 resist pumps, 1Developer Line Add. Info: TYP A M/C Typ FC-9801F#1 SD/HD Typ Commandpost System Vers. MK8G2.38 Alarm File ALM00166.OEN Sp. Al.File AL00TT.OEN GEM 1.72 Lines 1(3) Pumps 1xmini EBR programable T/H-Controller Semifab CD200 Backrinse yes Lines 1 x H-Nozzle Rinse yes Backrinse yes
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1
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 |
Dresden, Saxony |
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 |
250491
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Tel
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Tel |
MK7-S |
in Lithography Equipment
TEL MK7-S Coater_Developer:missing parts: 2 resist pumps, 1Developer Line Add. Info: TYP A M/C Typ FC-9801F#2 SD/HD Typ Commandpost System Vers. MK8G2.38 Alarm File ALM00166.OEN Sp. Al.File AL00TT.OEN GEM 1.72 Lines 1(3) Pumps 1xmini EBR programable T/H-Controller Shinwa CP-I Backrinse yes Lines 1 x H-Nozzle Rinse yes Backrinse yes Last time in production: 01.01.24
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1
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Dresden, Saxony |
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